Fabrication of nb-doped tio2 transparent conducting films by postdeposition annealing under nitrogen atmosphere

Sohei Okazaki, Junpei Ohkubo, Shoichiro Nakao, Yasushi Hirose, Taro Hitosugi, Tetsuya Hasegawa

    Research output: Contribution to journalArticlepeer-review

    8 Citations (Scopus)

    Abstract

    Here, we report that highly conductive polycrystalline anatase Nb-doped TiO2 (TNO) thin films can be prepared via crystallization of amorphous precursors under N2 atmosphere. An optimized TNO film on a glass substrate exhibited a low resistivity of 8:4 104 cm and an absorbance of 6% at a wavelength of 460 nm. These transport and optical properties were comparable to those of TNO films fabricated by vacuum annealing. This demonstrates the potential of TNO as an electrode for GaN-based light-emitting diodes.

    Original languageEnglish
    Article number118003
    JournalJapanese journal of applied physics
    Volume51
    Issue number11
    DOIs
    Publication statusPublished - 2012 Nov

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy(all)

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