Fabrication of optically active Er3+-doped Bi2O 3-SiO2 glass thin films by pulsed laser deposition

Shusaku Akiba; Masahiro Takakura; Akifumi Matsuda; Wakana Hara; Takashi Okada; Takahiro Watanabe; Yuki Kondo; Setsuro Ito; Parhat Ahmet; Toyohiro Chikyo; Setsuhisa Tanabe; Teiichi Hanada; Mamoru Yoshimoto

doi:10.1143/JJAP.45.5933

Fabrication of optically active Er³⁺-doped Bi₂O ₃-SiO₂ glass thin films by pulsed laser deposition

Shusaku Akiba, Masahiro Takakura, Akifumi Matsuda, Wakana Hara, Takashi Okada, Takahiro Watanabe, Yuki Kondo, Setsuro Ito, Parhat Ahmet, Toyohiro Chikyo, Setsuhisa Tanabe, Teiichi Hanada, Mamoru Yoshimoto

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

We examined the fabrication conditions of optically active Er ³⁺-doped Bi₂O₃-SiO₂ glass thin films prepared by pulsed laser deposition using a glass target with a nominal composition (mol %) of 41Bi₂O₃·57SiO ₂·2Er₂O₃. The transparent glass films were obtained at 200°C under 5 × 10^-2Torr O₂. The glass films were found to possess a composition and a refractive index close to those of the bulk glass used as the target. The films exhibited a broad emission of Er³⁺ ions at around 1.5-1.6 μm as well as Er ³⁺ upconversion-pumped fluorescence in the 500-700 nm range.

Original language	English
Pages (from-to)	5933-5935
Number of pages	3
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	45
Issue number	7
DOIs	https://doi.org/10.1143/JJAP.45.5933
Publication status	Published - 2006 Jul 7
Externally published	Yes

Keywords

Bismuth oxide
Erbium
Glass thin film
Luminescence
Pulsed laser deposition
Upconversion fluorescence

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

Access to Document

10.1143/JJAP.45.5933

Cite this

Akiba, S., Takakura, M., Matsuda, A., Hara, W., Okada, T., Watanabe, T., Kondo, Y., Ito, S., Ahmet, P., Chikyo, T., Tanabe, S., Hanada, T., & Yoshimoto, M. (2006). Fabrication of optically active Er³⁺-doped Bi₂O ₃-SiO₂ glass thin films by pulsed laser deposition. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 45(7), 5933-5935. https://doi.org/10.1143/JJAP.45.5933

Fabrication of optically active Er³⁺-doped Bi₂O ₃-SiO₂ glass thin films by pulsed laser deposition. / Akiba, Shusaku; Takakura, Masahiro; Matsuda, Akifumi et al.
In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 45, No. 7, 07.07.2006, p. 5933-5935.

Research output: Contribution to journal › Article › peer-review

Akiba, S, Takakura, M, Matsuda, A, Hara, W, Okada, T, Watanabe, T, Kondo, Y, Ito, S, Ahmet, P, Chikyo, T, Tanabe, S, Hanada, T & Yoshimoto, M 2006, 'Fabrication of optically active Er³⁺-doped Bi₂O ₃-SiO₂ glass thin films by pulsed laser deposition', Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, vol. 45, no. 7, pp. 5933-5935. https://doi.org/10.1143/JJAP.45.5933

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title = "Fabrication of optically active Er3+-doped Bi2O 3-SiO2 glass thin films by pulsed laser deposition",

abstract = "We examined the fabrication conditions of optically active Er 3+-doped Bi2O3-SiO2 glass thin films prepared by pulsed laser deposition using a glass target with a nominal composition (mol %) of 41Bi2O3·57SiO 2·2Er2O3. The transparent glass films were obtained at 200°C under 5 × 10-2Torr O2. The glass films were found to possess a composition and a refractive index close to those of the bulk glass used as the target. The films exhibited a broad emission of Er3+ ions at around 1.5-1.6 μm as well as Er 3+ upconversion-pumped fluorescence in the 500-700 nm range.",

keywords = "Bismuth oxide, Erbium, Glass thin film, Luminescence, Pulsed laser deposition, Upconversion fluorescence",

author = "Shusaku Akiba and Masahiro Takakura and Akifumi Matsuda and Wakana Hara and Takashi Okada and Takahiro Watanabe and Yuki Kondo and Setsuro Ito and Parhat Ahmet and Toyohiro Chikyo and Setsuhisa Tanabe and Teiichi Hanada and Mamoru Yoshimoto",

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AU - Hara, Wakana

AU - Okada, Takashi

AU - Watanabe, Takahiro

AU - Kondo, Yuki

AU - Ito, Setsuro

AU - Ahmet, Parhat

AU - Chikyo, Toyohiro

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AU - Hanada, Teiichi

AU - Yoshimoto, Mamoru

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AB - We examined the fabrication conditions of optically active Er 3+-doped Bi2O3-SiO2 glass thin films prepared by pulsed laser deposition using a glass target with a nominal composition (mol %) of 41Bi2O3·57SiO 2·2Er2O3. The transparent glass films were obtained at 200°C under 5 × 10-2Torr O2. The glass films were found to possess a composition and a refractive index close to those of the bulk glass used as the target. The films exhibited a broad emission of Er3+ ions at around 1.5-1.6 μm as well as Er 3+ upconversion-pumped fluorescence in the 500-700 nm range.

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KW - Pulsed laser deposition

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