TY - JOUR
T1 - Fabrication of ordered submicrometer-scale convex lens array via nanoimprint lithography using an anodized aluminum mold
AU - Kawahara, Kai
AU - Kikuchi, Tatsuya
AU - Natsui, Shungo
AU - Suzuki, Ryosuke O.
N1 - Funding Information:
This study was conducted at Hokkaido University and was supported by the “Nanotechnology Platform” Program of the Ministry of Education, Culture, Sports, Science, and Technology ( MEXT ), Japan. The authors wish to thank Ms. Ryoko Kurishiba for the SEM observations and Mr. Keita Suzuki for the XPS measurements. This study was financially supported by the Sumitomo Foundation , Japan, the Light Metal Educational Foundation, Japan , and the Japan Society for the Promotion of Science (JSPS) “KAKENHI”.
Publisher Copyright:
© 2017 Elsevier B.V.
PY - 2018/1/5
Y1 - 2018/1/5
N2 - The fabrication of submicrometer-scale ordered convex lens array was demonstrated through nanoimprint lithography using an aluminum dimple array mold fabricated by etidronic acid anodizing and selective oxide dissolution. Highly-pure aluminum plates were anodized in a 0.2 M etidronic acid solution at 260 V for the formation of ordered porous alumina. The anodized specimens were immersed in a 0.2 M CrO3/0.51 M H3PO4 solution to dissolve the porous alumina, and an ordered dimple array measuring approximately 670 nm in dimple diameter was obtained on the aluminum surface. Phosphonic acid-based self-assembled monolayers (SAMs) were coated on the aluminum dimple array as a release agent for nanoimprint lithography. The shape of the aluminum dimple array mold was transferred to a UV curable photopolymer by nanoimprint lithography. An ordered convex lens array, which corresponded to the negative shape of the dimple array, was successfully obtained by the removal of curable polymer. However, the polymer surface was contaminated with phosphonate molecules due to the multilayered phosphonate films being formed on the aluminum mold. This contamination can be avoided by ultrasonication of the aluminum mold before nanoimprint lithography.
AB - The fabrication of submicrometer-scale ordered convex lens array was demonstrated through nanoimprint lithography using an aluminum dimple array mold fabricated by etidronic acid anodizing and selective oxide dissolution. Highly-pure aluminum plates were anodized in a 0.2 M etidronic acid solution at 260 V for the formation of ordered porous alumina. The anodized specimens were immersed in a 0.2 M CrO3/0.51 M H3PO4 solution to dissolve the porous alumina, and an ordered dimple array measuring approximately 670 nm in dimple diameter was obtained on the aluminum surface. Phosphonic acid-based self-assembled monolayers (SAMs) were coated on the aluminum dimple array as a release agent for nanoimprint lithography. The shape of the aluminum dimple array mold was transferred to a UV curable photopolymer by nanoimprint lithography. An ordered convex lens array, which corresponded to the negative shape of the dimple array, was successfully obtained by the removal of curable polymer. However, the polymer surface was contaminated with phosphonate molecules due to the multilayered phosphonate films being formed on the aluminum mold. This contamination can be avoided by ultrasonication of the aluminum mold before nanoimprint lithography.
KW - Aluminum mold
KW - Anodizing
KW - Convex lens array
KW - Nanoimprint lithography
KW - Self-assembled monolayers
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U2 - 10.1016/j.mee.2017.10.016
DO - 10.1016/j.mee.2017.10.016
M3 - Article
AN - SCOPUS:85033494450
SN - 0167-9317
VL - 185-186
SP - 61
EP - 68
JO - Microelectronic Engineering
JF - Microelectronic Engineering
ER -