Fabrication of periodic nanohole multilayer structure on silicon surface toward photonic crystal

Y. Ohno, N. Ozaki, S. Takeda

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)


We have studied a porous structure on silicon surfaces that is introduced by electron irradiation. The structure consists of nanometer-sized holes arranged on silicon surfaces. Investigatinghe size and the distribution of surface nanoholes in a temperature range from about 4K to about 600K, we have estimated the porosity on a surface with nanoholes. We have fabricated a periodic dielectric multilayer structure on a silicon surface by introducing nanoholes periodically in one direction: alternating layers with different dielectric constants (the dielectric contrast of about 1.08), spaced by a distance of 100nm. We can form periodic dielectric layers at arbitrary locations on surfaces by scanning an electron beam, changing the periodicity and the dielectric constant by varying irradiation condition.

Original languageEnglish
Pages (from-to)1222-1225
Number of pages4
JournalPhysica B: Condensed Matter
Publication statusPublished - 2001 Dec
Externally publishedYes


  • Photonic crystal
  • Silicon
  • Surface nanohole
  • Transmission electron microscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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