Fabrication of thermal microprobes with a sub-100 nm metal-to-metal junction

D. W. Lee, Takahito Ono, Masayoshi Esashi

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)


A technological approach for making a miniature thermocouple and nano-heater on a microprobe is presented. A non-uniform silicon dioxide (SiO2) layer is formed on a silicon V-groove by low-temperature oxidation, and then the non-uniform SiO2 layer is selectively etched in a wet solution to make a nano-hole at the apex of a SiO2 tip. A nano-junction of Pt/Cr (or Au/Cr) and Ni was exactly formed and situated through the nano-hole without an alignment process. The nano-junction acts as a thermocouple and nano-heater. The diameter of the fabricated nano-junction is below 100 nm. This technique has a high reproducibility and is suitable for mass production. Basic characteristics for application of the thermal microprobe are evaluated using a temperature-controlled oven and a photon counting CCD camera.

Original languageEnglish
Pages (from-to)29-32
Number of pages4
Issue number1
Publication statusPublished - 2002 Feb


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