TY - JOUR
T1 - Fabrication of transmission color filters using silicon subwavelength gratings on quartz substrates
AU - Kanamori, Yoshiaki
AU - Shimono, Masaya
AU - Hane, Kazuhiro
N1 - Funding Information:
Manuscript received June 8, 2006; revised July 25, 2006. This work was supported in part by the Japan Science and Technology Agency (JST), and performed at Venture Business Laboratory in Tohoku University, Japan. The authors are with the Department of Nanomechanics, Tohoku University, Sendai 980-8579, Japan (e-mail: kanamori@hane.mech.tohoku.ac.jp). Digital Object Identifier 10.1109/LPT.2006.883208 Fig. 1. Schematic of the fabricated color filter design. The grating period and width are defined as and a, respectively.
PY - 2006/10/15
Y1 - 2006/10/15
N2 - We investigate theoretically and experimentally transmission color filters using silicon subwavelength gratings on quartz substrates. Each grating area is 120 μm-square, which is suitable pixel size for displays and multichannel detectors. In the fabrication, electron beam lithography and fast atom beam etching are used. The grating periods are 400, 350, and 440 nm for the red, green, and blue filters, respectively. The transmission spectrum obtained from a coupling between an incident light and the submicrometer periodic grating matches with human color perception. The transmittances of 71.1%, 58.1%, and 59.3% are obtained for the red, green, and blue filters, respectively.
AB - We investigate theoretically and experimentally transmission color filters using silicon subwavelength gratings on quartz substrates. Each grating area is 120 μm-square, which is suitable pixel size for displays and multichannel detectors. In the fabrication, electron beam lithography and fast atom beam etching are used. The grating periods are 400, 350, and 440 nm for the red, green, and blue filters, respectively. The transmission spectrum obtained from a coupling between an incident light and the submicrometer periodic grating matches with human color perception. The transmittances of 71.1%, 58.1%, and 59.3% are obtained for the red, green, and blue filters, respectively.
KW - Micromachining
KW - Optical device fabrication
KW - Optical filters
KW - Optical gratings
KW - Periodic structures
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U2 - 10.1109/LPT.2006.883208
DO - 10.1109/LPT.2006.883208
M3 - Article
AN - SCOPUS:33750131973
SN - 1041-1135
VL - 18
SP - 2126
EP - 2128
JO - IEEE Photonics Technology Letters
JF - IEEE Photonics Technology Letters
IS - 20
ER -