Fabrication of Ultrasonic Sensors Using Micro Cantilevers and Characteristic Measurement in Vacuum for Acoustic Emission Sensing

Kengo Takata; Takashi Sasaki; Mitsuyuki Tanaka; Hiroshi Saito; Daisuke Matsuura; Kazuhiro Hane

doi:10.1002/ecj.11810

Fabrication of Ultrasonic Sensors Using Micro Cantilevers and Characteristic Measurement in Vacuum for Acoustic Emission Sensing

Kengo Takata, Takashi Sasaki, Mitsuyuki Tanaka, Hiroshi Saito, Daisuke Matsuura, Kazuhiro Hane

ENG - Finemechanics

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

Acoustic emission (AE) sensors are attractive for the detection of machine fracture in real time. We fabricated AE sensors using the MEMS technology. The AE sensors consisted of silicon cantilevers resonating at frequencies of 50, 100, and 150 kHz. Silicon piezoresistors were installed close to the cantilevers. In order to obtain an ambient pressure appropriate for the operation of the cantilevers, the Q factor of the cantilevers was calculated by analytical models as a function of pressure. The properties of the fabricated sensors were measured in a vacuum chamber. We also tentatively packaged the AE sensor and an amplifier in a vacuum to decrease the influences of air damping and noise.

Original language	English
Pages (from-to)	68-74
Number of pages	7
Journal	Electronics and Communications in Japan
Volume	99
Issue number	4
DOIs	https://doi.org/10.1002/ecj.11810
Publication status	Published - 2016 Apr 1

Keywords

Q factor
acoustic emission sensor
piezo resistance
silicon cantilever
vacuum package

ASJC Scopus subject areas

Signal Processing
Physics and Astronomy(all)
Computer Networks and Communications
Electrical and Electronic Engineering
Applied Mathematics

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10.1002/ecj.11810

Cite this

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abstract = "Acoustic emission (AE) sensors are attractive for the detection of machine fracture in real time. We fabricated AE sensors using the MEMS technology. The AE sensors consisted of silicon cantilevers resonating at frequencies of 50, 100, and 150 kHz. Silicon piezoresistors were installed close to the cantilevers. In order to obtain an ambient pressure appropriate for the operation of the cantilevers, the Q factor of the cantilevers was calculated by analytical models as a function of pressure. The properties of the fabricated sensors were measured in a vacuum chamber. We also tentatively packaged the AE sensor and an amplifier in a vacuum to decrease the influences of air damping and noise.",

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AU - Takata, Kengo

AU - Sasaki, Takashi

AU - Tanaka, Mitsuyuki

AU - Saito, Hiroshi

AU - Matsuura, Daisuke

AU - Hane, Kazuhiro

PY - 2016/4/1

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AB - Acoustic emission (AE) sensors are attractive for the detection of machine fracture in real time. We fabricated AE sensors using the MEMS technology. The AE sensors consisted of silicon cantilevers resonating at frequencies of 50, 100, and 150 kHz. Silicon piezoresistors were installed close to the cantilevers. In order to obtain an ambient pressure appropriate for the operation of the cantilevers, the Q factor of the cantilevers was calculated by analytical models as a function of pressure. The properties of the fabricated sensors were measured in a vacuum chamber. We also tentatively packaged the AE sensor and an amplifier in a vacuum to decrease the influences of air damping and noise.

KW - Q factor

KW - acoustic emission sensor

KW - piezo resistance

KW - silicon cantilever

KW - vacuum package

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Fabrication of Ultrasonic Sensors Using Micro Cantilevers and Characteristic Measurement in Vacuum for Acoustic Emission Sensing

Abstract

Keywords

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