@inproceedings{40d9f9b445b64d3b947404e241fa9954,
title = "Fabrication sub-micron gratings based on embossing",
abstract = "We demonstrated two kinds of sub-micron gratings fabricated by embossing method from anisotropically etched silicon molds. One kind of grating is a line grating with a pitch of 500 nm; the other kind is grating array with a pitch of 200 nm. We investigated the feasibility of the fabrication method for the micro fabrication of the high aspect ratio silicon molds: that is for fabricating molds by using electron beam lithography plus fast atom beam (FAB) etching. The replication yield, repeatability and efficiency from the original master are good. This technique can also be used to fabricate other sub-micron scale structures.",
keywords = "Atomic beams, Cathodes, Electron beams, Embossing, Etching, Fabrication, Gratings, Microstructure, Resists, Silicon",
author = "Yigui Li and Chun Hui and Jun Zhu and Jingquan Liu and Y. Kanamori",
note = "Publisher Copyright: {\textcopyright} 2003 IEEE.; 5th Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS 2003, DTIP 2003 ; Conference date: 05-05-2003 Through 07-05-2003",
year = "2003",
doi = "10.1109/DTIP.2003.1287066",
language = "English",
series = "DTIP 2003 - Design, Test, Integration and Packaging of MEMS/MOEMS 2003",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "350--352",
editor = "Bernard Courtois and Karam, {Jean Michel} and Jan Korvink and Karen Markus and Keren Bergman and Bernd Michel",
booktitle = "DTIP 2003 - Design, Test, Integration and Packaging of MEMS/MOEMS 2003",
}