TY - GEN
T1 - Fast atom beam-based fabrication of high-efficienct blazed grating using slanting angle control of a substrate
AU - Lee, Cha Bum
AU - Hane, Kazuhiro
AU - Lee, Sun Kyu
PY - 2010/12/1
Y1 - 2010/12/1
N2 - This paper presents electromagnetic analysis of Si-based small period blazed reflection gratings for a period of 0.6 - 1.5 μm in terms of the rigorous coupled wave analysis (RCWA) and its fabrication using fast atom beam (FAB) etching method. The optimized blazed gratings were successfully fabricated on a slanted silicon substrate by FAB etching method, and diffraction efficiencies (DE) for four kinds of gratings were evaluated from optical testing and these results showed good agreement with these theoretical values, respectively.
AB - This paper presents electromagnetic analysis of Si-based small period blazed reflection gratings for a period of 0.6 - 1.5 μm in terms of the rigorous coupled wave analysis (RCWA) and its fabrication using fast atom beam (FAB) etching method. The optimized blazed gratings were successfully fabricated on a slanted silicon substrate by FAB etching method, and diffraction efficiencies (DE) for four kinds of gratings were evaluated from optical testing and these results showed good agreement with these theoretical values, respectively.
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U2 - 10.1109/OMEMS.2010.5672141
DO - 10.1109/OMEMS.2010.5672141
M3 - Conference contribution
AN - SCOPUS:78751552674
SN - 9781424489251
T3 - 2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010
SP - 149
EP - 150
BT - 2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010
T2 - 2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010
Y2 - 9 August 2010 through 12 August 2010
ER -