Fin-height controlled TiN-gate FinFET CMOS based on experimental mobility

Y. X. Liu, T. Matsukawa, K. Endo, M. Masahrara, S. O'uchi, H. Yamauchi, K. Ishii, J. Tsukada, Y. Ishikawa, K. Sakamoto, E. Suzuki

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)


This paper presents the fin-height controlled TiN-gate FinFET CMOS technology based on the experimental carrier mobility data. The good current matching by tuning the N-channel fin-height and the excellent transfer performance in the fabricated TiN-gate CMOS inverter are demonstrated. The developed technologies are attractive to materialize the high-performance FinFET CMOS circuits.

Original languageEnglish
Pages (from-to)2101-2104
Number of pages4
JournalMicroelectronic Engineering
Issue number9-10
Publication statusPublished - 2007 Sept


  • Current matching
  • Fin-height control
  • FinFET
  • Mobility
  • Orientation-dependent wet etching
  • TiN-gate


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