First-order isothermal desorption kinetics of chlorine on SiH2Cl2-adsorbed Si(100) surface

Hitoshi Sakamoto, Yuji Takakuwa, Toyokazu Hori, Tetsuhiro Horie, Nobuo Miyamoto

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)


The isothermal desorption kinetics of chlorine on Si(100) was investigated by observing the chloride coverage on the surface with ultraviolet photoelectron spectroscopy. The samples for desorption were prepared by dichlorosilane adsorption at 600°C under 1 × 10-6 Torr. We found that the decrease of the chloride coverage showed an exponential dependence on the isothermal annealing time, indicating clearly that the chlorine desorption was a first-order reaction. From the Arrhenius plot of the first-order reaction coefficient, the activation energy of chlorine desorption was obtained to be 48.1 kcal/mol. Furthermore, we clarified by quadrupole mass spectroscopy that the dominant desorption species was the diatomic SiCl molecule. To interpret all these results, we proposed a chlorine desorption reaction model based on the collision between a chloride and a migrating Si adatom released from an atomic step.

Original languageEnglish
Pages (from-to)27-32
Number of pages6
JournalApplied Surface Science
Issue number1-4
Publication statusPublished - 1994 Jan 2

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


Dive into the research topics of 'First-order isothermal desorption kinetics of chlorine on SiH2Cl2-adsorbed Si(100) surface'. Together they form a unique fingerprint.

Cite this