Fluorescent resist materials for nanoimprint lithography

Research output: Contribution to journalArticlepeer-review


UV-curable resins and thermoplastic polymers doped with a fluorescent dye were useful for checking uniformity of residual layer thickness, detecting resist pattern defect, and monitoring resin adhesion to a mold surface in nanoimprinting. The facile and nondestructive inspection method by fluorescent microscopy is described.

Original languageEnglish
Pages (from-to)139-140
Number of pages2
Issue number3
Publication statusPublished - 2011 Mar


  • Defect detection
  • Fluorescent microscopy
  • Fluorescent resist
  • Partem inspection
  • Residual layer thickness
  • Resin adhesion
  • Thermal nanoimprint lithography
  • UV nanoimprint lithography


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