TY - JOUR
T1 - Formation of 0.3-nm-high stepped polymer surface by thermal nanoimprinting
AU - Tan, Geng
AU - Inoue, Naoya
AU - Funabasama, Tomoyuki
AU - Mita, Masahiro
AU - Okuda, Norimichi
AU - Mori, Junichi
AU - Koyama, Koji
AU - Kaneko, Satoru
AU - Nakagawa, Masaru
AU - Matsuda, Akifumi
AU - Yoshimoto, Mamoru
PY - 2014/5
Y1 - 2014/5
N2 - We performed atomic-scale surface patterning with a vertical resolution of approximately 0.3nm on a poly(methyl methacrylate) (PMMA) polymer sheet (10 × 10mm2) by thermal nanoimprinting using an atomically stepped sapphire template (α-Al2O3 single crystal). The sapphire mold with (101̄2) r-plane exhibited regularly arranged straight steps with a uniform height of approximately 0.31 nm. The template nanopattern could be transferred onto the surface of the PMMA sheet under the imprinting conditions of 0.2 MPa load for 300 s at 140 °C. Atomic stairs with approximately 0.26-nm-high straight steps and approximately 600-nm-wide terraces were formed on the PMMA surface.
AB - We performed atomic-scale surface patterning with a vertical resolution of approximately 0.3nm on a poly(methyl methacrylate) (PMMA) polymer sheet (10 × 10mm2) by thermal nanoimprinting using an atomically stepped sapphire template (α-Al2O3 single crystal). The sapphire mold with (101̄2) r-plane exhibited regularly arranged straight steps with a uniform height of approximately 0.31 nm. The template nanopattern could be transferred onto the surface of the PMMA sheet under the imprinting conditions of 0.2 MPa load for 300 s at 140 °C. Atomic stairs with approximately 0.26-nm-high straight steps and approximately 600-nm-wide terraces were formed on the PMMA surface.
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U2 - 10.7567/APEX.7.055202
DO - 10.7567/APEX.7.055202
M3 - Article
AN - SCOPUS:84904609662
SN - 1882-0778
VL - 7
JO - Applied Physics Express
JF - Applied Physics Express
IS - 5
M1 - 055202
ER -