Formation of GaN films by Ga Ion direct deposition under nitrogen radical atmosphere

Masaya Toda, Junichi Yanagisawa, Kenji Gamo, Yoichi Akasaka

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)


Formation of hydrogen-free gallium nitride (GaN) thin layers by ion beam direct deposition method under nitrogen ambient was investigated. After a Ga ion beam at an energy of 100 eV was irradiated on a chip of a Si(111) wafer under a nitrogen gas pressure of 2×10-4 Torr using a tungsten hot filament, the composition and the chemical bonding nature of the deposited materials were investigated by x-ray photoelectron spectroscopy (XPS). Although the deposited material using a filament power of 250 W showed almost the metallic gallium nature, the XPS spectra of the deposited Ga using the hot filament at a power of 300 W was very similar to that of an epitaxially grown GaN reference, indicating the possibility of the formation of GaN thin layer using the present method. Because the pure N2 gas was used as the nitrogen source, no impurity fragments should be incorporated in the deposited materials. As a result, it is shown that the formation of hydrogen-free GaN layers is possible by Ga ion beam direct deposition under nitrogen atmosphere using N2 gas and the hot filament.

Original languageEnglish
Pages (from-to)3012-3015
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number6
Publication statusPublished - 2004 Nov


Dive into the research topics of 'Formation of GaN films by Ga Ion direct deposition under nitrogen radical atmosphere'. Together they form a unique fingerprint.

Cite this