Formation of microscopic polymer structure in LCs by patterned UV irradiation using polymerization inhibitor

Takahiro Ishinabe; Sou Matsuoka; Yosei Shibata; Hideo Fujikake

doi:10.3169/MTA.8.196

Formation of microscopic polymer structure in LCs by patterned UV irradiation using polymerization inhibitor

Takahiro Ishinabe, Sou Matsuoka, Yosei Shibata, Hideo Fujikake

ENG - Electronic Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

We controlled the fine-pitch polymer aggregation in liquid crystals (LCs) two-dimensionally via patterned ultraviolet (UV) irradiation, where a photomask was used to precisely control the light distribution. The combination of high-intensity UV light and a polymerization inhibitor suppressed polymerization in the masked area, and improved the uniformity of LC alignment between fine-pitch polymer structures. We were able to electrically control the diffraction patterns of polymer-dispersed LCs.

Original language	English
Pages (from-to)	196-201
Number of pages	6
Journal	ITE Transactions on Media Technology and Applications
Volume	8
Issue number	4
DOIs	https://doi.org/10.3169/MTA.8.196
Publication status	Published - 2020

Keywords

Liquid crystal
Pattern UV irradiation
Polymer aggregation
Polymer dispersed liquid crystal
Polymerization inhibitor

ASJC Scopus subject areas

Signal Processing
Media Technology
Computer Graphics and Computer-Aided Design

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10.3169/MTA.8.196

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title = "Formation of microscopic polymer structure in LCs by patterned UV irradiation using polymerization inhibitor",

abstract = "We controlled the fine-pitch polymer aggregation in liquid crystals (LCs) two-dimensionally via patterned ultraviolet (UV) irradiation, where a photomask was used to precisely control the light distribution. The combination of high-intensity UV light and a polymerization inhibitor suppressed polymerization in the masked area, and improved the uniformity of LC alignment between fine-pitch polymer structures. We were able to electrically control the diffraction patterns of polymer-dispersed LCs.",

keywords = "Liquid crystal, Pattern UV irradiation, Polymer aggregation, Polymer dispersed liquid crystal, Polymerization inhibitor",

author = "Takahiro Ishinabe and Sou Matsuoka and Yosei Shibata and Hideo Fujikake",

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year = "2020",

doi = "10.3169/MTA.8.196",

language = "English",

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T1 - Formation of microscopic polymer structure in LCs by patterned UV irradiation using polymerization inhibitor

AU - Ishinabe, Takahiro

AU - Matsuoka, Sou

AU - Shibata, Yosei

AU - Fujikake, Hideo

PY - 2020

Y1 - 2020

N2 - We controlled the fine-pitch polymer aggregation in liquid crystals (LCs) two-dimensionally via patterned ultraviolet (UV) irradiation, where a photomask was used to precisely control the light distribution. The combination of high-intensity UV light and a polymerization inhibitor suppressed polymerization in the masked area, and improved the uniformity of LC alignment between fine-pitch polymer structures. We were able to electrically control the diffraction patterns of polymer-dispersed LCs.

AB - We controlled the fine-pitch polymer aggregation in liquid crystals (LCs) two-dimensionally via patterned ultraviolet (UV) irradiation, where a photomask was used to precisely control the light distribution. The combination of high-intensity UV light and a polymerization inhibitor suppressed polymerization in the masked area, and improved the uniformity of LC alignment between fine-pitch polymer structures. We were able to electrically control the diffraction patterns of polymer-dispersed LCs.

KW - Liquid crystal

KW - Pattern UV irradiation

KW - Polymer aggregation

KW - Polymer dispersed liquid crystal

KW - Polymerization inhibitor

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JO - ITE Transactions on Media Technology and Applications

JF - ITE Transactions on Media Technology and Applications

IS - 4

ER -

Formation of microscopic polymer structure in LCs by patterned UV irradiation using polymerization inhibitor

Abstract

Keywords

ASJC Scopus subject areas

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