Formation of nanoparticles by control of electron temperature in hollow-typed magnetron radio frequency CH4/H2 plasma

Junichi Emi; Kohgi Kato; Toshimi Abe; Satoru Iizuka

doi:10.1143/JJAP.45.8071

Formation of nanoparticles by control of electron temperature in hollow-typed magnetron radio frequency CH₄/H₂ plasma

Junichi Emi, Kohgi Kato, Toshimi Abe, Satoru Iizuka

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

In this study, we investigate the effects of electron temperature T _e on the production of nanoparticles by using the grid-biasing method in hollow-typed magnetron radio frequency (RF) CH₄/H₂ plasma. We find that nanoparticles are produced in low-T_e plasma. On the other hand, thin film depositions, such as nanowalls, are mainly observed and almost no nanoparticles are created in high-T_e plasma. This implies that a reduction in the CH₂/CH₃ radical ratio is important for producing nanoparticles, together with a reduction in sheath potential in front of the substrate. The change in electron temperature in plasma has a marked effect on film quality.

Original language	English
Pages (from-to)	8071-8074
Number of pages	4
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	45
Issue number	10 B
DOIs	https://doi.org/10.1143/JJAP.45.8071
Publication status	Published - 2006 Oct 21
Externally published	Yes

Keywords

CH/H plasma
Diamond
Graphite
Low-electron-temperature plasma
Nanoparticle

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

Access to Document

10.1143/JJAP.45.8071

Cite this

Formation of nanoparticles by control of electron temperature in hollow-typed magnetron radio frequency CH₄/H₂ plasma. / Emi, Junichi; Kato, Kohgi; Abe, Toshimi et al.
In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 45, No. 10 B, 21.10.2006, p. 8071-8074.

Research output: Contribution to journal › Article › peer-review

@article{1e92a225250a40cd994cf213d23bcadb,

title = "Formation of nanoparticles by control of electron temperature in hollow-typed magnetron radio frequency CH4/H2 plasma",

abstract = "In this study, we investigate the effects of electron temperature T e on the production of nanoparticles by using the grid-biasing method in hollow-typed magnetron radio frequency (RF) CH4/H2 plasma. We find that nanoparticles are produced in low-Te plasma. On the other hand, thin film depositions, such as nanowalls, are mainly observed and almost no nanoparticles are created in high-Te plasma. This implies that a reduction in the CH2/CH3 radical ratio is important for producing nanoparticles, together with a reduction in sheath potential in front of the substrate. The change in electron temperature in plasma has a marked effect on film quality.",

keywords = "CH/H plasma, Diamond, Graphite, Low-electron-temperature plasma, Nanoparticle",

author = "Junichi Emi and Kohgi Kato and Toshimi Abe and Satoru Iizuka",

year = "2006",

month = oct,

day = "21",

doi = "10.1143/JJAP.45.8071",

language = "English",

volume = "45",

pages = "8071--8074",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "10 B",

}

TY - JOUR

T1 - Formation of nanoparticles by control of electron temperature in hollow-typed magnetron radio frequency CH4/H2 plasma

AU - Emi, Junichi

AU - Kato, Kohgi

AU - Abe, Toshimi

AU - Iizuka, Satoru

PY - 2006/10/21

Y1 - 2006/10/21

N2 - In this study, we investigate the effects of electron temperature T e on the production of nanoparticles by using the grid-biasing method in hollow-typed magnetron radio frequency (RF) CH4/H2 plasma. We find that nanoparticles are produced in low-Te plasma. On the other hand, thin film depositions, such as nanowalls, are mainly observed and almost no nanoparticles are created in high-Te plasma. This implies that a reduction in the CH2/CH3 radical ratio is important for producing nanoparticles, together with a reduction in sheath potential in front of the substrate. The change in electron temperature in plasma has a marked effect on film quality.

AB - In this study, we investigate the effects of electron temperature T e on the production of nanoparticles by using the grid-biasing method in hollow-typed magnetron radio frequency (RF) CH4/H2 plasma. We find that nanoparticles are produced in low-Te plasma. On the other hand, thin film depositions, such as nanowalls, are mainly observed and almost no nanoparticles are created in high-Te plasma. This implies that a reduction in the CH2/CH3 radical ratio is important for producing nanoparticles, together with a reduction in sheath potential in front of the substrate. The change in electron temperature in plasma has a marked effect on film quality.

KW - CH/H plasma

KW - Diamond

KW - Graphite

KW - Low-electron-temperature plasma

KW - Nanoparticle

UR - http://www.scopus.com/inward/record.url?scp=34247619930&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34247619930&partnerID=8YFLogxK

U2 - 10.1143/JJAP.45.8071

DO - 10.1143/JJAP.45.8071

M3 - Article

AN - SCOPUS:34247619930

SN - 0021-4922

VL - 45

SP - 8071

EP - 8074

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

IS - 10 B

ER -