TY - JOUR
T1 - Free-standing subwavelength grid infrared cut filter of 90 mm diameter for LPP EUV light source
AU - Suzuki, Yukio
AU - Totsu, Kentaro
AU - Moriyama, Masaaki
AU - Esashi, Masayoshi
AU - Tanaka, Shuji
N1 - Funding Information:
This study was granted by the Japan Society for the Promotion of Science (JSPS) through the “ Funding Program for World-Leading Innovative R&D on Science and Technology ” (FIRST Program) initiated by the Council for Science and Technology Policy (CSTP). All fabrication was performed in Hands-on Access Fabrication Facility a member of “Nanotechnology Platform of the Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan, at the Center for Integrated Nanotechnology Support, Tohoku University. Optical evaluation was supported by GIGAPHOTON INC.
Publisher Copyright:
© 2014 Elsevier B.V.
PY - 2015/8/11
Y1 - 2015/8/11
N2 - Abstract A subwavelength grid infrared (IR) cut filter as large as 90 mm in diameter was fabricated and tested on a 6 inch Si wafer for a laser-produced plasma (LPP) extreme ultraviolet (EUV) light source used in the next generation lithography tools. The IR cut filter is a grid type, which has higher thermal stability compared with a conventional multilayer metal membrane filter. The grid is a free-standing Molybdenum coated Si honeycomb structure with a thickness of 5 μm, a wire width of only 0.35 μm and a pitch of 4.5 μm. Such a large-size free-standing microstructure was successfully fabricated by carefully balancing film stress at each process step. The fabricated IR cut filter demonstrated 99.7% rejection for 10.6 μm IR light. The IR cut filter was finally installed in a LPP EUV light source.
AB - Abstract A subwavelength grid infrared (IR) cut filter as large as 90 mm in diameter was fabricated and tested on a 6 inch Si wafer for a laser-produced plasma (LPP) extreme ultraviolet (EUV) light source used in the next generation lithography tools. The IR cut filter is a grid type, which has higher thermal stability compared with a conventional multilayer metal membrane filter. The grid is a free-standing Molybdenum coated Si honeycomb structure with a thickness of 5 μm, a wire width of only 0.35 μm and a pitch of 4.5 μm. Such a large-size free-standing microstructure was successfully fabricated by carefully balancing film stress at each process step. The fabricated IR cut filter demonstrated 99.7% rejection for 10.6 μm IR light. The IR cut filter was finally installed in a LPP EUV light source.
KW - Balancing film stress
KW - EUV lithography
KW - IR filter
KW - LPP EUV lighting source
KW - Subwavelength grid
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U2 - 10.1016/j.sna.2014.07.006
DO - 10.1016/j.sna.2014.07.006
M3 - Article
AN - SCOPUS:84938997775
SN - 0924-4247
VL - 231
SP - 59
EP - 64
JO - Sensors and Actuators A: Physical
JF - Sensors and Actuators A: Physical
M1 - 8852
ER -