Glancing angle dependence of the x-ray emission measured under total reflection angle x-ray spectroscopy (Traxs) condition during reflection high energy electron diffraction observation

Toshiro Yamanaka; Shozo Ino; Takashi Hanada; Hiroshi Daimon

doi:10.1143/JJAP.31.L1503

Glancing angle dependence of the x-ray emission measured under total reflection angle x-ray spectroscopy (Traxs) condition during reflection high energy electron diffraction observation

Toshiro Yamanaka, Shozo Ino, Takashi Hanada, Hiroshi Daimon

IMR - Materials Design Division

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

We measured the glancing angle (0_g) dependence of the X-ray emission from Si(111)-√3x √3-Ag and α - √3x √3Au surfaces during Reflection High Energy Electron Diffraction observation under the Total Reflection Angle X-ray Spectroscopy condition. The characteristic X-rays AgL and AuM decreased according to 1 /sinΘ_g. The function 1 /sin_Θgis easily understood in terms of Ag and Au atoms located at the top layer of the surface. The SiK and the bremsstrahlung showed broad peaks around 8°. These trends of the curves are explained by an analysis using Monte Carlo electron trajectory simulation. By measuring the glancing angle dependence we can easily distinguish whether or not a specific kind of atom is confined at the top layer of the surface.

Original language	English
Pages (from-to)	L1503-L1505
Journal	Japanese Journal of Applied Physics
Volume	31
Issue number	10
DOIs	https://doi.org/10.1143/JJAP.31.L1503
Publication status	Published - 1992 Oct

Keywords

Depth distribution of atoms
Electron trajectory in solid
Metal on si(111)
Rheed
Traxs
X-ray

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title = "Glancing angle dependence of the x-ray emission measured under total reflection angle x-ray spectroscopy (Traxs) condition during reflection high energy electron diffraction observation",

abstract = "We measured the glancing angle (0g) dependence of the X-ray emission from Si(111)-√3x √3-Ag and α - √3x √3Au surfaces during Reflection High Energy Electron Diffraction observation under the Total Reflection Angle X-ray Spectroscopy condition. The characteristic X-rays AgL and AuM decreased according to 1 /sinΘg. The function 1 /sinΘgis easily understood in terms of Ag and Au atoms located at the top layer of the surface. The SiK and the bremsstrahlung showed broad peaks around 8°. These trends of the curves are explained by an analysis using Monte Carlo electron trajectory simulation. By measuring the glancing angle dependence we can easily distinguish whether or not a specific kind of atom is confined at the top layer of the surface.",

keywords = "Depth distribution of atoms, Electron trajectory in solid, Metal on si(111), Rheed, Traxs, X-ray",

author = "Toshiro Yamanaka and Shozo Ino and Takashi Hanada and Hiroshi Daimon",

year = "1992",

month = oct,

doi = "10.1143/JJAP.31.L1503",

language = "English",

volume = "31",

pages = "L1503--L1505",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "10",

}

Glancing angle dependence of the x-ray emission measured under total reflection angle x-ray spectroscopy (Traxs) condition during reflection high energy electron diffraction observation. / Yamanaka, Toshiro; Ino, Shozo; Hanada, Takashi et al.
In: Japanese Journal of Applied Physics, Vol. 31, No. 10, 10.1992, p. L1503-L1505.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Glancing angle dependence of the x-ray emission measured under total reflection angle x-ray spectroscopy (Traxs) condition during reflection high energy electron diffraction observation

AU - Yamanaka, Toshiro

AU - Ino, Shozo

AU - Hanada, Takashi

AU - Daimon, Hiroshi

PY - 1992/10

Y1 - 1992/10

N2 - We measured the glancing angle (0g) dependence of the X-ray emission from Si(111)-√3x √3-Ag and α - √3x √3Au surfaces during Reflection High Energy Electron Diffraction observation under the Total Reflection Angle X-ray Spectroscopy condition. The characteristic X-rays AgL and AuM decreased according to 1 /sinΘg. The function 1 /sinΘgis easily understood in terms of Ag and Au atoms located at the top layer of the surface. The SiK and the bremsstrahlung showed broad peaks around 8°. These trends of the curves are explained by an analysis using Monte Carlo electron trajectory simulation. By measuring the glancing angle dependence we can easily distinguish whether or not a specific kind of atom is confined at the top layer of the surface.

AB - We measured the glancing angle (0g) dependence of the X-ray emission from Si(111)-√3x √3-Ag and α - √3x √3Au surfaces during Reflection High Energy Electron Diffraction observation under the Total Reflection Angle X-ray Spectroscopy condition. The characteristic X-rays AgL and AuM decreased according to 1 /sinΘg. The function 1 /sinΘgis easily understood in terms of Ag and Au atoms located at the top layer of the surface. The SiK and the bremsstrahlung showed broad peaks around 8°. These trends of the curves are explained by an analysis using Monte Carlo electron trajectory simulation. By measuring the glancing angle dependence we can easily distinguish whether or not a specific kind of atom is confined at the top layer of the surface.

KW - Depth distribution of atoms

KW - Electron trajectory in solid

KW - Metal on si(111)

KW - Rheed

KW - Traxs

KW - X-ray

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DO - 10.1143/JJAP.31.L1503

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AN - SCOPUS:0039961131

SN - 0021-4922

VL - 31

SP - L1503-L1505

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 10

ER -

Glancing angle dependence of the x-ray emission measured under total reflection angle x-ray spectroscopy (Traxs) condition during reflection high energy electron diffraction observation

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