Growth of ZnO nanowires in hollow-type magnetron O2/Ar RF plasma

Hideki Ono; Satoru Iizuka

doi:10.1016/j.tsf.2009.07.176

Growth of ZnO nanowires in hollow-type magnetron O₂/Ar RF plasma

Hideki Ono, Satoru Iizuka

ENG - Electrical Engineering

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

In this study we investigate how the sputtering of zinc from a zinc target is influenced by the properties of O₂/Ar plasma when the discharge parameters such as gas pressure ratio and target bias voltage are changed. We also investigate plasma conditions for the formation of ZnO nanowires that are created and deposited on the substrate. We found that a plasma condition with strong optical emission from Zn neutrals is an important factor for the deposition of ZnO nanowires. Both the growth of nanowires and the emission intensity from Zn strongly depend on the partial pressure of oxygen.

Original language	English
Pages (from-to)	1016-1019
Number of pages	4
Journal	Thin Solid Films
Volume	518
Issue number	3
DOIs	https://doi.org/10.1016/j.tsf.2009.07.176
Publication status	Published - 2009 Dec 30

Keywords

Magnetron plasma
Nanowire
Sputtering
ZnO

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

Access to Document

10.1016/j.tsf.2009.07.176

Cite this

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title = "Growth of ZnO nanowires in hollow-type magnetron O2/Ar RF plasma",

abstract = "In this study we investigate how the sputtering of zinc from a zinc target is influenced by the properties of O2/Ar plasma when the discharge parameters such as gas pressure ratio and target bias voltage are changed. We also investigate plasma conditions for the formation of ZnO nanowires that are created and deposited on the substrate. We found that a plasma condition with strong optical emission from Zn neutrals is an important factor for the deposition of ZnO nanowires. Both the growth of nanowires and the emission intensity from Zn strongly depend on the partial pressure of oxygen.",

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T1 - Growth of ZnO nanowires in hollow-type magnetron O2/Ar RF plasma

AU - Ono, Hideki

AU - Iizuka, Satoru

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Y1 - 2009/12/30

N2 - In this study we investigate how the sputtering of zinc from a zinc target is influenced by the properties of O2/Ar plasma when the discharge parameters such as gas pressure ratio and target bias voltage are changed. We also investigate plasma conditions for the formation of ZnO nanowires that are created and deposited on the substrate. We found that a plasma condition with strong optical emission from Zn neutrals is an important factor for the deposition of ZnO nanowires. Both the growth of nanowires and the emission intensity from Zn strongly depend on the partial pressure of oxygen.

AB - In this study we investigate how the sputtering of zinc from a zinc target is influenced by the properties of O2/Ar plasma when the discharge parameters such as gas pressure ratio and target bias voltage are changed. We also investigate plasma conditions for the formation of ZnO nanowires that are created and deposited on the substrate. We found that a plasma condition with strong optical emission from Zn neutrals is an important factor for the deposition of ZnO nanowires. Both the growth of nanowires and the emission intensity from Zn strongly depend on the partial pressure of oxygen.

KW - Magnetron plasma

KW - Nanowire

KW - Sputtering

KW - ZnO

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