TY - JOUR
T1 - Guided-mode resonant grating filter fabricated on silicon-on-insulator substrate
AU - Kanamori, Yoshiaki
AU - Kitani, Takashi
AU - Hane, Kazuhiro
PY - 2006/3/8
Y1 - 2006/3/8
N2 - We propose a guided-mode resonant grating (GMRG) filter using silicon-on-insulator wafer. In the fabrication, electron beam lithography and fast atom beam etching are used. The periods of the three filters are 680, 700, and 720 nm, respectively. The reflectivity is measured to be nearly 100% at the wavelength of 1502nm for the 700 nm period GMRG filter with a fill factor of 0.760. The optical properties of the filters are analyzed using a rigorous coupled-wave analysis (RCWA).
AB - We propose a guided-mode resonant grating (GMRG) filter using silicon-on-insulator wafer. In the fabrication, electron beam lithography and fast atom beam etching are used. The periods of the three filters are 680, 700, and 720 nm, respectively. The reflectivity is measured to be nearly 100% at the wavelength of 1502nm for the 700 nm period GMRG filter with a fill factor of 0.760. The optical properties of the filters are analyzed using a rigorous coupled-wave analysis (RCWA).
KW - Electron beam lithography
KW - Guided-mode resonant grating filter
KW - Micromachining
KW - Rigorous coupled-wave analysis
KW - Silicon-on-insulator
KW - Subwavelength grating
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U2 - 10.1143/JJAP.45.1883
DO - 10.1143/JJAP.45.1883
M3 - Article
AN - SCOPUS:33644882536
SN - 0021-4922
VL - 45
SP - 1883
EP - 1885
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 3 A
ER -