Guided-mode resonant grating filter fabricated on silicon-on-insulator substrate

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We propose a guided-mode resonant grating (GMRG) filter using silicon-on-insulator wafer. In the fabrication, electron beam lithography and fast atom beam etching are used. The periods of the three filters are 680, 700, and 720 nm, respectively. The reflectivity is measured to be nearly 100% at the wavelength of 1502nm for the 700 nm period GMRG filter with a fill factor of 0.760. The optical properties of the filters are analyzed using a rigorous coupled-wave analysis (RCWA).

Original languageEnglish
Pages (from-to)1883-1885
Number of pages3
JournalJapanese Journal of Applied Physics
Issue number3 A
Publication statusPublished - 2006 Mar 8


  • Electron beam lithography
  • Guided-mode resonant grating filter
  • Micromachining
  • Rigorous coupled-wave analysis
  • Silicon-on-insulator
  • Subwavelength grating


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