We propose a guided-mode resonant grating (GMRG) filter using silicon-on-insulator wafer. In the fabrication, electron beam lithography and fast atom beam etching are used. The periods of the three filters are 680, 700, and 720 nm, respectively. The reflectivity is measured to be nearly 100% at the wavelength of 1502nm for the 700 nm period GMRG filter with a fill factor of 0.760. The optical properties of the filters are analyzed using a rigorous coupled-wave analysis (RCWA).
- Electron beam lithography
- Guided-mode resonant grating filter
- Rigorous coupled-wave analysis
- Subwavelength grating