TY - GEN
T1 - Hard X-ray photoelectron spectroscopy analysis for organic-inorganic hybrid materials formation
AU - Cho, Ken
AU - Takenaka, Kosuke
AU - Setsuhara, Yuichi
AU - Shiratani, Masaharu
AU - Sekine, Makoto
AU - Hori, Masaru
AU - Ikenaga, Eiji
AU - Kondo, Hiroki
AU - Nakatsuka, Osamu
AU - Zaima, Shigeaki
PY - 2010/1/1
Y1 - 2010/1/1
N2 - Interactions of nitrogen plasmas with polymer surfaces were investigated using hard x-ray photoelectron spectroscopy (HXPES) to complete depth analyses of the chemical bonding states in the nano-surface layer of polymethylmethacrylate (PMMA) films via. The PMMA films were exposed to the nitrogen plasmas sustained via inductive coupling of radio-frequency (RF) power with multiple low-inductance antenna (LIA) modules. The etching rate of the PMMA films was 38 nm/min. The surface roughness of PMMA increased from 0.3 nm to 0.7 nm with increased exposure time. The HXPES was carried out for non-destructive depth analysis of chemical bonding states in the nano-surface layer of PMMA films. The HXPES results indicated that nitrogen functionalities were formed in the shallower regions up to about 27 nm from the surface without showing significant degradation of the molecular structure of PMMA due to nitrogen plasma exposure.
AB - Interactions of nitrogen plasmas with polymer surfaces were investigated using hard x-ray photoelectron spectroscopy (HXPES) to complete depth analyses of the chemical bonding states in the nano-surface layer of polymethylmethacrylate (PMMA) films via. The PMMA films were exposed to the nitrogen plasmas sustained via inductive coupling of radio-frequency (RF) power with multiple low-inductance antenna (LIA) modules. The etching rate of the PMMA films was 38 nm/min. The surface roughness of PMMA increased from 0.3 nm to 0.7 nm with increased exposure time. The HXPES was carried out for non-destructive depth analysis of chemical bonding states in the nano-surface layer of PMMA films. The HXPES results indicated that nitrogen functionalities were formed in the shallower regions up to about 27 nm from the surface without showing significant degradation of the molecular structure of PMMA due to nitrogen plasma exposure.
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U2 - 10.1002/9780470917145.ch27
DO - 10.1002/9780470917145.ch27
M3 - Conference contribution
AN - SCOPUS:77956030531
SN - 9780470909171
T3 - Ceramic Transactions
SP - 183
EP - 188
BT - Characterization and Control of Interfaces for High Quality Advanced Materials III - Proc. 3rd Int. Conf. on Characterization and Control of Interfaces for High Quality Advanced Materials,ICCCI2009
PB - American Ceramic Society
T2 - 3rd International Conference on Characterization and Control of Interfaces for High Quality Advanced Materials, ICCCI2009
Y2 - 6 September 2009 through 9 September 2009
ER -