Helium film formed in 1.2 nm pore in zeolite templated carbon

Yusuke Kinosita, Ryo Toda, Taku Matsushita, Mitsunori Hieda, Nobuo Wada, Hirotomo Nishihara, Takashi Kyotani

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)


We have measured the vapor pressure of 4He adsorbed in zeolite templated carbon (ZTC) at 4.2 K, in order to examine 4He film growth in the nanopore. ZTC has a framework made of non-stacked graphene, and has a relatively uniform 1.2 nm pore with three-dimensional (3D) periodicity of 1.4 nm. The nanoporous substrate is a candidate to realize superfluid 4He film with closer 3D connectivity than those studied so far. From the vapor pressure, coverage dependences of the thickness and the two-dimensional (2D) isothermal compressibility of 4He film were derived using thermodynamic equations. The 2D compressibility indicates the onset coverage n 1 of the second adsorption layer around 20 μmol/m 2. It is confirmed that the 4He film in the 1.2 nm pores grows uniformly at least up to 1.3-1.5 n 1.

Original languageEnglish
Pages (from-to)275-280
Number of pages6
JournalJournal of Low Temperature Physics
Issue number1-2
Publication statusPublished - 2010 Jan


  • Film growth
  • Helium 4
  • Nanopore


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