High efficient light-emitting diodes with antireflection subwavelength gratings

Y. Kanamori, M. Ishimori, K. Hane

Research output: Contribution to journalArticlepeer-review

95 Citations (Scopus)


A two-dimensional subwavelength grating (SWG) has been fabricated on a GaAlAs light-emitting diode (LED). The SWG is patterned by electron beam lithography and etched by fast atom beam with Cl2 and SF6 gases. The fabricated grating has 200-nm period and the tapered grating shape with aspect ratio of 1.38 to prevent reflection in the spectral region including 850 nm light emission. The emission is increased by 21.6% at the normal emission angle. The total emittance is increased by 60% with the SWG in comparison with that of the flat surface.

Original languageEnglish
Pages (from-to)1064-1066
Number of pages3
JournalIEEE Photonics Technology Letters
Issue number8
Publication statusPublished - 2002 Aug


  • Electron beam lithography
  • Etching
  • Gratings
  • Light-emitting diodes
  • Nanotechnology
  • Periodic structures


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