TY - JOUR
T1 - High-frequency level-up shifter based on 0.18μm vertical metal-oxide-semiconductor field-effect transistors with 70% reduction of overshoot voltage above power supply voltage
AU - Tanoi, Satoru
AU - Endoh, Tetsuo
N1 - Publisher Copyright:
© 2015 The Japan Society of Applied Physics.
PY - 2015/4/1
Y1 - 2015/4/1
N2 - A high-frequency and high-voltage-tolerant level-up shifter is proposed. In the design, a voltage limiter with a preset and a dynamic biasing feedback circuit are introduced. In a typical simulation, our circuit based on 0.18μm vertical metal-oxide-semiconductor field-effect transistors (MOSFETs) shows a 70% reduction of the overshoot voltage of the MOSFETs above the power supply voltage (1.8 V VDD) compared with a conventional circuit. It realizes a typical operation frequency of 164MHz when the maximum voltage applied to all MOSFETs is limited to 1.8V. The maximum achievable operation frequency is more than 1.6 times that of a conventional circuit. The variation of the maximum voltage applied to the MOSFETs in our circuit is also reduced by about 24% compared with that of the conventional circuit in a process-corner simulation with the variation of VDD and temperature.
AB - A high-frequency and high-voltage-tolerant level-up shifter is proposed. In the design, a voltage limiter with a preset and a dynamic biasing feedback circuit are introduced. In a typical simulation, our circuit based on 0.18μm vertical metal-oxide-semiconductor field-effect transistors (MOSFETs) shows a 70% reduction of the overshoot voltage of the MOSFETs above the power supply voltage (1.8 V VDD) compared with a conventional circuit. It realizes a typical operation frequency of 164MHz when the maximum voltage applied to all MOSFETs is limited to 1.8V. The maximum achievable operation frequency is more than 1.6 times that of a conventional circuit. The variation of the maximum voltage applied to the MOSFETs in our circuit is also reduced by about 24% compared with that of the conventional circuit in a process-corner simulation with the variation of VDD and temperature.
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U2 - 10.7567/JJAP.54.04DE03
DO - 10.7567/JJAP.54.04DE03
M3 - Article
AN - SCOPUS:84926361536
SN - 0021-4922
VL - 54
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 4
M1 - 04DE03
ER -