TY - GEN
T1 - High-Speed preparation of titania films by laser chemical vapor deposition
AU - Goto, Takashi
AU - Kimura, Teiichi
AU - Tu, Rong
PY - 2007
Y1 - 2007
N2 - Titanium oxide (TiO2) films were prepared by MOCVD and laser-assisted CVD (LCVD), and investigated the effect of laser irradiation on the deposition rate, morphology and preferred orientation. In MOCVD by using Ti (O-i-C3H7)2(dpm)2, the crystal structure changed from (004) oriented anatase to (200) oriented rutile with increasing substrate temperature (TSUb). A columnar texture was developed over TSUb=873K. The highest deposition rate was 30 μm/h at TSUb=1000 K. The assist of laser tremendously enhanced the deposition rate up to 700 and 1900 μm/h by using Ti (O-i-C3H 7)2(dpm)2 and Ti(O-n-C4H 9)4 precursors, respectively. The plasma formation was accompanied to the enhancement of deposition rates. The morphology ranging from fine grain columnar, feather-like columnar and dense plate-like TiO2 films were observed depending on mainly substrate temperature. Significantly (213) and (200) oriented anatase and (110) oriented rutile films were obtained by LCVD.
AB - Titanium oxide (TiO2) films were prepared by MOCVD and laser-assisted CVD (LCVD), and investigated the effect of laser irradiation on the deposition rate, morphology and preferred orientation. In MOCVD by using Ti (O-i-C3H7)2(dpm)2, the crystal structure changed from (004) oriented anatase to (200) oriented rutile with increasing substrate temperature (TSUb). A columnar texture was developed over TSUb=873K. The highest deposition rate was 30 μm/h at TSUb=1000 K. The assist of laser tremendously enhanced the deposition rate up to 700 and 1900 μm/h by using Ti (O-i-C3H 7)2(dpm)2 and Ti(O-n-C4H 9)4 precursors, respectively. The plasma formation was accompanied to the enhancement of deposition rates. The morphology ranging from fine grain columnar, feather-like columnar and dense plate-like TiO2 films were observed depending on mainly substrate temperature. Significantly (213) and (200) oriented anatase and (110) oriented rutile films were obtained by LCVD.
KW - Anatase
KW - Deposition rate
KW - Laser chemical vapor deposition
KW - Rutile
KW - TiO film
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M3 - Conference contribution
AN - SCOPUS:58349089492
SN - 9781605601335
T3 - Materials Science and Technology Conference and Exhibition, MS and T'07 - "Exploring Structure, Processing, and Applications Across Multiple Materials Systems"
SP - 2997
EP - 3006
BT - Materials Science and Technology Conference and Exhibition, MS and T'07 - "Exploring Structure, Processing, and Applications Across Multiple Materials Systems"
T2 - Materials Science and Technology Conference and Exhibition, MS and T'07 - "Exploring Structure, Processing, and Applications Across Multiple Materials Systems"
Y2 - 16 September 2007 through 20 September 2007
ER -