Higher order nonlinear dielectric microscopy

Yasuo Cho, Koya Ohara

Research output: Contribution to journalConference articlepeer-review


A higher order nonlinear dielectric microscopy technique with higher lateral and depth resolution that conventional nonlinear dielectric imaging is investigated. The proposed technique involves the measurement of higher order nonlinear dielectric constants, with a depth resolution of down to 1.5 nm. The technique is demonstrated to be very useful for observing surface layers of the order of unit cell thickness on ferroelectric materials.

Original languageEnglish
Pages (from-to)329-334
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Publication statusPublished - 2002
EventFerroelectric Thin Films X - Boston, MA, United States
Duration: 2001 Nov 252001 Nov 29


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