Hot filament CVD diamond coating of TiC sliders

S. Konoplyuk; T. Abe; T. Takagi; T. Uchimoto

doi:10.1016/j.diamond.2006.11.044

Hot filament CVD diamond coating of TiC sliders

S. Konoplyuk, T. Abe, T. Takagi, T. Uchimoto

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

Hot filament chemical vapour deposition (HF CVD) process with low filament temperature (∼ 1650 °C) was utilized for the diamond coating of TiC samples. Porous substrates were fabricated by pulse discharge sintering (PDS) to create more nucleation sites. Nucleation density and morphology of deposited diamond films were studied using scanning electron microscopy (SEM). It was found that the highest growth rate occurs at substrate temperature of 980 °C. Evaluation of the residual stress in deposited films was carried out by Raman spectroscopy. Ball on disk tests were performed with steel as a counterface material. After polishing diamond films demonstrated good sliding performance: friction coefficient of 0.08 and wear rate of 10^{- 17} m³/N m.

Original language	English
Pages (from-to)	609-615
Number of pages	7
Journal	Diamond and Related Materials
Volume	16
Issue number	3
DOIs	https://doi.org/10.1016/j.diamond.2006.11.044
Publication status	Published - 2007 Mar

Keywords

Diamond film
Porous TiC substrate
Pulse discharge sintering
Wear and friction

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Chemistry(all)
Mechanical Engineering
Materials Chemistry
Electrical and Electronic Engineering

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10.1016/j.diamond.2006.11.044

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title = "Hot filament CVD diamond coating of TiC sliders",

abstract = "Hot filament chemical vapour deposition (HF CVD) process with low filament temperature (∼ 1650 °C) was utilized for the diamond coating of TiC samples. Porous substrates were fabricated by pulse discharge sintering (PDS) to create more nucleation sites. Nucleation density and morphology of deposited diamond films were studied using scanning electron microscopy (SEM). It was found that the highest growth rate occurs at substrate temperature of 980 °C. Evaluation of the residual stress in deposited films was carried out by Raman spectroscopy. Ball on disk tests were performed with steel as a counterface material. After polishing diamond films demonstrated good sliding performance: friction coefficient of 0.08 and wear rate of 10- 17 m3/N m.",

keywords = "Diamond film, Porous TiC substrate, Pulse discharge sintering, Wear and friction",

author = "S. Konoplyuk and T. Abe and T. Takagi and T. Uchimoto",

note = "Funding Information: We acknowledge Japan Science and Technology Agency for their financial support. The authors would also like to thank Prof. Endo of Miyagi National College of Technology for his assistance on SEM analysis.",

year = "2007",

month = mar,

doi = "10.1016/j.diamond.2006.11.044",

language = "English",

volume = "16",

pages = "609--615",

journal = "Diamond and Related Materials",

issn = "0925-9635",

publisher = "Elsevier BV",

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TY - JOUR

T1 - Hot filament CVD diamond coating of TiC sliders

AU - Konoplyuk, S.

AU - Abe, T.

AU - Takagi, T.

AU - Uchimoto, T.

N1 - Funding Information: We acknowledge Japan Science and Technology Agency for their financial support. The authors would also like to thank Prof. Endo of Miyagi National College of Technology for his assistance on SEM analysis.

PY - 2007/3

Y1 - 2007/3

N2 - Hot filament chemical vapour deposition (HF CVD) process with low filament temperature (∼ 1650 °C) was utilized for the diamond coating of TiC samples. Porous substrates were fabricated by pulse discharge sintering (PDS) to create more nucleation sites. Nucleation density and morphology of deposited diamond films were studied using scanning electron microscopy (SEM). It was found that the highest growth rate occurs at substrate temperature of 980 °C. Evaluation of the residual stress in deposited films was carried out by Raman spectroscopy. Ball on disk tests were performed with steel as a counterface material. After polishing diamond films demonstrated good sliding performance: friction coefficient of 0.08 and wear rate of 10- 17 m3/N m.

AB - Hot filament chemical vapour deposition (HF CVD) process with low filament temperature (∼ 1650 °C) was utilized for the diamond coating of TiC samples. Porous substrates were fabricated by pulse discharge sintering (PDS) to create more nucleation sites. Nucleation density and morphology of deposited diamond films were studied using scanning electron microscopy (SEM). It was found that the highest growth rate occurs at substrate temperature of 980 °C. Evaluation of the residual stress in deposited films was carried out by Raman spectroscopy. Ball on disk tests were performed with steel as a counterface material. After polishing diamond films demonstrated good sliding performance: friction coefficient of 0.08 and wear rate of 10- 17 m3/N m.

KW - Diamond film

KW - Porous TiC substrate

KW - Pulse discharge sintering

KW - Wear and friction

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DO - 10.1016/j.diamond.2006.11.044

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SP - 609

EP - 615

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 3

ER -

Hot filament CVD diamond coating of TiC sliders

Abstract

Keywords

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