Hydrogen retention induced by ion implantation in tungsten trioxide films

Aichi Inouye; Shunya Yamamoto; Shinji Nagata; Masahito Yoshikawa; Tatsuo Shikama

doi:10.1016/j.nimb.2009.01.139

Hydrogen retention induced by ion implantation in tungsten trioxide films

Aichi Inouye, Shunya Yamamoto, Shinji Nagata, Masahito Yoshikawa, Tatsuo Shikama

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

The relation between hydrogen retention and optical properties of an amorphous tungsten trioxide (WO₃) film was investigated using 10 keV H₂⁺ ion implantation. WO₃ films (350 nm) covered by W layers (200 nm) were deposited on SiO₂ glass substrates by sputtering in a mixture of Ar and O₂ gases. The hydrogen concentration in the WO₃ film was characterized by elastic recoil detection analysis (ERDA). The hydrogen concentration in the WO₃ film increased by 0.4 H/W in proportion to the fluence of the H₂⁺ ions implanted into the W layer. The optical absorption coefficient of the film at 750 nm increased linearly by 3 μm^-1 with an increase in the concentration of the implanted hydrogen up to 0.1 H/W, and saturated at 4 μm^-1 with the concentration higher than 0.1 H/W. These results indicate that the introduced hydrogen up to a hydrogen concentration of 0.1 H/W can be monitored by measuring the optical absorbance in the WO₃ films.

Original language	English
Pages (from-to)	1480-1483
Number of pages	4
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	267
Issue number	8-9
DOIs	https://doi.org/10.1016/j.nimb.2009.01.139
Publication status	Published - 2009 May 1
Externally published	Yes

Keywords

Coloration
ERDA
Hydrogen
Tungsten oxide

ASJC Scopus subject areas

Nuclear and High Energy Physics
Instrumentation

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10.1016/j.nimb.2009.01.139

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title = "Hydrogen retention induced by ion implantation in tungsten trioxide films",

abstract = "The relation between hydrogen retention and optical properties of an amorphous tungsten trioxide (WO3) film was investigated using 10 keV H2+ ion implantation. WO3 films (350 nm) covered by W layers (200 nm) were deposited on SiO2 glass substrates by sputtering in a mixture of Ar and O2 gases. The hydrogen concentration in the WO3 film was characterized by elastic recoil detection analysis (ERDA). The hydrogen concentration in the WO3 film increased by 0.4 H/W in proportion to the fluence of the H2+ ions implanted into the W layer. The optical absorption coefficient of the film at 750 nm increased linearly by 3 μm-1 with an increase in the concentration of the implanted hydrogen up to 0.1 H/W, and saturated at 4 μm-1 with the concentration higher than 0.1 H/W. These results indicate that the introduced hydrogen up to a hydrogen concentration of 0.1 H/W can be monitored by measuring the optical absorbance in the WO3 films.",

keywords = "Coloration, ERDA, Hydrogen, Tungsten oxide",

author = "Aichi Inouye and Shunya Yamamoto and Shinji Nagata and Masahito Yoshikawa and Tatsuo Shikama",

note = "Funding Information: The authors are grateful to staff member A. Yokoyama of the JAEA for his assistance in carrying out irradiations. This work was partly supported by a Grant from Support for International Technical Exchange from the TEPCO Research Foundation and a Grant-in-Aid for Scientific Research (B) from the Japan Society for the Promotion of Science (No. 20360412).",

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doi = "10.1016/j.nimb.2009.01.139",

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journal = "Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms",

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T1 - Hydrogen retention induced by ion implantation in tungsten trioxide films

AU - Inouye, Aichi

AU - Yamamoto, Shunya

AU - Nagata, Shinji

AU - Yoshikawa, Masahito

AU - Shikama, Tatsuo

N1 - Funding Information: The authors are grateful to staff member A. Yokoyama of the JAEA for his assistance in carrying out irradiations. This work was partly supported by a Grant from Support for International Technical Exchange from the TEPCO Research Foundation and a Grant-in-Aid for Scientific Research (B) from the Japan Society for the Promotion of Science (No. 20360412).

PY - 2009/5/1

Y1 - 2009/5/1

N2 - The relation between hydrogen retention and optical properties of an amorphous tungsten trioxide (WO3) film was investigated using 10 keV H2+ ion implantation. WO3 films (350 nm) covered by W layers (200 nm) were deposited on SiO2 glass substrates by sputtering in a mixture of Ar and O2 gases. The hydrogen concentration in the WO3 film was characterized by elastic recoil detection analysis (ERDA). The hydrogen concentration in the WO3 film increased by 0.4 H/W in proportion to the fluence of the H2+ ions implanted into the W layer. The optical absorption coefficient of the film at 750 nm increased linearly by 3 μm-1 with an increase in the concentration of the implanted hydrogen up to 0.1 H/W, and saturated at 4 μm-1 with the concentration higher than 0.1 H/W. These results indicate that the introduced hydrogen up to a hydrogen concentration of 0.1 H/W can be monitored by measuring the optical absorbance in the WO3 films.

AB - The relation between hydrogen retention and optical properties of an amorphous tungsten trioxide (WO3) film was investigated using 10 keV H2+ ion implantation. WO3 films (350 nm) covered by W layers (200 nm) were deposited on SiO2 glass substrates by sputtering in a mixture of Ar and O2 gases. The hydrogen concentration in the WO3 film was characterized by elastic recoil detection analysis (ERDA). The hydrogen concentration in the WO3 film increased by 0.4 H/W in proportion to the fluence of the H2+ ions implanted into the W layer. The optical absorption coefficient of the film at 750 nm increased linearly by 3 μm-1 with an increase in the concentration of the implanted hydrogen up to 0.1 H/W, and saturated at 4 μm-1 with the concentration higher than 0.1 H/W. These results indicate that the introduced hydrogen up to a hydrogen concentration of 0.1 H/W can be monitored by measuring the optical absorbance in the WO3 films.

KW - Coloration

KW - ERDA

KW - Hydrogen

KW - Tungsten oxide

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Hydrogen retention induced by ion implantation in tungsten trioxide films

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