Hydrogenated amorphous carbon films deposited by low-frequency plasma chemical vapor deposition at room temperature

M. Shimozuma; G. Tochitani; H. Ohno; H. Tagashira; J. Nakahara

doi:10.1063/1.343846

Hydrogenated amorphous carbon films deposited by low-frequency plasma chemical vapor deposition at room temperature

M. Shimozuma, G. Tochitani, H. Ohno, H. Tagashira, J. Nakahara

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Hokkaido University

Research output: Contribution to journal › Article › peer-review

18 Citations (Scopus)

Abstract

Hydrogenated amorphous carbon (a-C:H) films were prepared at room temperature by low-frequency (50-Hz) plasma chemical vapor deposition using CH₄ and H₂. The a-C:H films were transparent, highly resistive, and very uniform. Infrared absorption measurements, as well as Raman spectroscopy, indicated that the C bonding in the a-C:H films was predominantly sp³. Moreover, the optical band gap of the a-C:H films was measured.

Original language	English
Pages (from-to)	447-449
Number of pages	3
Journal	Journal of Applied Physics
Volume	66
Issue number	1
DOIs	https://doi.org/10.1063/1.343846
Publication status	Published - 1989

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abstract = "Hydrogenated amorphous carbon (a-C:H) films were prepared at room temperature by low-frequency (50-Hz) plasma chemical vapor deposition using CH4 and H2. The a-C:H films were transparent, highly resistive, and very uniform. Infrared absorption measurements, as well as Raman spectroscopy, indicated that the C bonding in the a-C:H films was predominantly sp3. Moreover, the optical band gap of the a-C:H films was measured.",

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AU - Tagashira, H.

AU - Nakahara, J.

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AB - Hydrogenated amorphous carbon (a-C:H) films were prepared at room temperature by low-frequency (50-Hz) plasma chemical vapor deposition using CH4 and H2. The a-C:H films were transparent, highly resistive, and very uniform. Infrared absorption measurements, as well as Raman spectroscopy, indicated that the C bonding in the a-C:H films was predominantly sp3. Moreover, the optical band gap of the a-C:H films was measured.

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Hydrogenated amorphous carbon films deposited by low-frequency plasma chemical vapor deposition at room temperature

Abstract

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