Hydroxyl-induced wetting of metals by water at near-ambient conditions

Susumu Yamamoto; Klas Andersson; Hendrik Bluhm; Guido Ketteler; David E. Starr; Theanne Schiros; Hirohito Ogasawara; Lars G.M. Pettersson; Miquel Salmeron; Anders Nilsson

doi:10.1021/jp0731654

Hydroxyl-induced wetting of metals by water at near-ambient conditions

Susumu Yamamoto, Klas Andersson, Hendrik Bluhm, Guido Ketteler, David E. Starr, Theanne Schiros, Hirohito Ogasawara, Lars G.M. Pettersson, Miquel Salmeron, Anders Nilsson

SRIS - Cross Fertilization Division

Research output: Contribution to journal › Article › peer-review

130 Citations (Scopus)

Abstract

We report different wetting properties of Cu(110) and Cu(111) at near-ambient conditions using in situ photoemission spectroscopy. At near-ambient conditions of pressure (1 Torr) and temperature (295 K), the Cu( 110) surface is covered with a mixed OH and H₂O layer, whereas the Cu(111) surface remains clean and adsorbate-free. We show that wetting is controlled by the presence of OH groups on the surface, acting as anchors for water adsorption. Hydroxylation of the Cu(110) surface is facilitated by a lower activation barrier for water dissociation compared to Cu(111).

Original language	English
Pages (from-to)	7848-7850
Number of pages	3
Journal	Journal of Physical Chemistry C
Volume	111
Issue number	22
DOIs	https://doi.org/10.1021/jp0731654
Publication status	Published - 2007 Jun 7

Access to Document

10.1021/jp0731654

Cite this

@article{3800aa88245945b8bf7b090a9c7be4ff,

title = "Hydroxyl-induced wetting of metals by water at near-ambient conditions",

abstract = "We report different wetting properties of Cu(110) and Cu(111) at near-ambient conditions using in situ photoemission spectroscopy. At near-ambient conditions of pressure (1 Torr) and temperature (295 K), the Cu( 110) surface is covered with a mixed OH and H2O layer, whereas the Cu(111) surface remains clean and adsorbate-free. We show that wetting is controlled by the presence of OH groups on the surface, acting as anchors for water adsorption. Hydroxylation of the Cu(110) surface is facilitated by a lower activation barrier for water dissociation compared to Cu(111).",

author = "Susumu Yamamoto and Klas Andersson and Hendrik Bluhm and Guido Ketteler and Starr, {David E.} and Theanne Schiros and Hirohito Ogasawara and Pettersson, {Lars G.M.} and Miquel Salmeron and Anders Nilsson",

year = "2007",

month = jun,

day = "7",

doi = "10.1021/jp0731654",

language = "English",

volume = "111",

pages = "7848--7850",

journal = "Journal of Physical Chemistry C",

issn = "1932-7447",

publisher = "American Chemical Society",

number = "22",

}

TY - JOUR

T1 - Hydroxyl-induced wetting of metals by water at near-ambient conditions

AU - Yamamoto, Susumu

AU - Andersson, Klas

AU - Bluhm, Hendrik

AU - Ketteler, Guido

AU - Starr, David E.

AU - Schiros, Theanne

AU - Ogasawara, Hirohito

AU - Pettersson, Lars G.M.

AU - Salmeron, Miquel

AU - Nilsson, Anders

PY - 2007/6/7

Y1 - 2007/6/7

N2 - We report different wetting properties of Cu(110) and Cu(111) at near-ambient conditions using in situ photoemission spectroscopy. At near-ambient conditions of pressure (1 Torr) and temperature (295 K), the Cu( 110) surface is covered with a mixed OH and H2O layer, whereas the Cu(111) surface remains clean and adsorbate-free. We show that wetting is controlled by the presence of OH groups on the surface, acting as anchors for water adsorption. Hydroxylation of the Cu(110) surface is facilitated by a lower activation barrier for water dissociation compared to Cu(111).

AB - We report different wetting properties of Cu(110) and Cu(111) at near-ambient conditions using in situ photoemission spectroscopy. At near-ambient conditions of pressure (1 Torr) and temperature (295 K), the Cu( 110) surface is covered with a mixed OH and H2O layer, whereas the Cu(111) surface remains clean and adsorbate-free. We show that wetting is controlled by the presence of OH groups on the surface, acting as anchors for water adsorption. Hydroxylation of the Cu(110) surface is facilitated by a lower activation barrier for water dissociation compared to Cu(111).

UR - http://www.scopus.com/inward/record.url?scp=34250776614&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34250776614&partnerID=8YFLogxK

U2 - 10.1021/jp0731654

DO - 10.1021/jp0731654

M3 - Article

AN - SCOPUS:34250776614

SN - 1932-7447

VL - 111

SP - 7848

EP - 7850

JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

IS - 22

ER -

Hydroxyl-induced wetting of metals by water at near-ambient conditions

Abstract

Access to Document

Other files and links

Fingerprint

Cite this