III-V-N alloys grown by MOVPE in H 2 and N 2 mixed carrier gases

S. Kuboya, Q. T. Thieu, S. Sanorpim, Ryuji Katayama, K. Onabe

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The MOVPE growth properties of GaAsN and InAsN in H 2 and N 2 mixed carrier gases are studied. The N contents of the GaAsN and InAsN films increase with increasing the N 2/(H 2+N 2) ratio in the H 2 and N 2 mixed carrier gas. The growth rate reduction of GaAsN films in higher N 2/(H 2+N 2) ratio is explained by the smaller diffusion coefficients of precursors. The pyrolysis of 1,1-dimethylhydrazine (DMHy) is investigated by a quadrupole mass spectrometer (QMS) that is combined with the MOVPE growth reactor. At lower temperatures, the pyrolysis of DMHy in H 2 carrier gas is higher than that in N 2 carrier gas. The results indicate that the higher N contents at the higher N 2/(H 2+N 2) ratios in the mixed carrier gases are attributed to the suppression of the decomposition of III-V-N films as NHx. The higher reactor pressure also exhibits higher N contents in each carrier gas. It is interpreted as the effect of the faster growth rates and the higher DMHy pyrolysis.

Original languageEnglish
Title of host publicationQuantum Sensing and Nanophotonic Devices IX
DOIs
Publication statusPublished - 2012
EventQuantum Sensing and Nanophotonic Devices IX - San Francisco, CA, United States
Duration: 2012 Jan 222012 Jan 26

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8268
ISSN (Print)0277-786X

Other

OtherQuantum Sensing and Nanophotonic Devices IX
Country/TerritoryUnited States
CitySan Francisco, CA
Period12/1/2212/1/26

Keywords

  • DMHy
  • III-V-N
  • MOCVD
  • MOVPE
  • alloy semiconductors
  • carrier gas
  • dilute nitrides
  • pyrolysis

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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