Image production mechanism for scanning nonlinear dielectric microscopy with super high resolution and its application to quantitative evaluation of linear and nonlinear dielectric properties of ferroelectric materials

Y. Cho, K. Ohara, S. Kazuta, H. Odagawa

Research output: Contribution to journalConference articlepeer-review

7 Citations (Scopus)

Abstract

A theory for scanning nonlinear dielectric microscopy (SNDM) and its application to the quantitative evaluation of the linear and nonlinear dielectric constants of dielectric materials are described. First, a general theorem for the capacitance variation under an applied electric field is derived and a capacitance variation susceptibility Snl, which is a very useful parameter for the quantitative measurement of nonlinear dielectric constants, is defined. This Snl is independent of the tip radius, and therefore the sensitivity of the SNDM probe does not change, even if a tip with a smaller radius is selected to obtain a finer resolution. Using the theoretical results and the data taken by SNDM, the quantitative linear and nonlinear dielectric properties of several dielectric materials were successfully determined. From the calculation of a one-dimensional image of a 180° c-c domain boundary, it is demonstrated that the SNDM has an atomic scale resolution.

Original languageEnglish
Pages (from-to)133-142
Number of pages10
JournalIntegrated Ferroelectrics
Volume32
Issue number1-4
DOIs
Publication statusPublished - 2001
Event12th International Symposium on Integrated Ferroelectrics - Aachen, Germany
Duration: 2000 Mar 122000 Mar 15

Keywords

  • Capacitance variation susceptibility
  • Depth sensitivity
  • Quantitative measurement
  • Scanning nonlinear dielectric microscopy
  • Theoretical resolution

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