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Improvement in ferroelectricity of HfxZr1-xO2 thin films using ZrO2 seed layer
Takashi Onaya, Toshihide Nabatame, Naomi Sawamoto, Akihiko Ohi, Naoki Ikeda, Toyohiro Chikyow, Atsushi Ogura
Research output: Contribution to journal › Article › peer-review
45
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(Scopus)