Abstract
We investigated annealing temperature $T-{a}$ dependence of tunnel magnetoresistance (TMR) ratio and magnetic properties for perpendicular-anisotropy (CoFe)100-XBX/MgO magnetic tunnel junctions (MTJs) with single (CoFe)100-XBX/MgO interface (s-MTJ) and double CoFeB-MgO interface (d-MTJ) structures with various boron compositions X. High TMR ratio over 100% was observed in the s-MTJ with X=35 at.% after annealing at 360 °C-400 °C, whereas the s-MTJ with X=30 at.% showed the degradation of TMR ratio with the increase of Ta above 360 °C, resulting from the decrease of perpendicular anisotropy. The d-MTJ with X=25 at.% maintained high TMR ratio up to Ta = 400°C owing to its higher perpendicular anisotropy compared with the s-MTJ. The difference of perpendicular anisotropy between the s-MTJ and the d-MTJ can be attributed to higher interfacial anisotropy together with lower saturation magnetization of the d-MTJs. The lower saturation magnetization is attributable to two MgO layers that suppress boron diffusion from CoFeB layers, which was verified by cross-sectional line analysis using electron energy-loss spectroscopy.
Original language | English |
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Article number | 7383297 |
Journal | IEEE Transactions on Magnetics |
Volume | 52 |
Issue number | 7 |
DOIs | |
Publication status | Published - 2016 Jul |
Keywords
- CoFeB-MgO
- magnetic tunnel junction
- STT-MRAM