In situ infrared and mass spectroscopic study of the reaction of WF 6 with hydrogenated amorphous silicon

Toshimasa Wadayama; Hironobu Shibata; Tsutomu Ohtani; Aritada Hatta

doi:10.1063/1.107716

In situ infrared and mass spectroscopic study of the reaction of WF ₆ with hydrogenated amorphous silicon

Toshimasa Wadayama, Hironobu Shibata, Tsutomu Ohtani, Aritada Hatta

ENV - Frontier Science for Advanced Environment

Tohoku University

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

The reaction process of tungsten hexafluoride (WF₆) with photochemically deposited hydrogenated amorphous silicon was studied by polarization modulation infrared spectroscopy and quadruple mass spectrometry. Infrared absorption bands due to species (SiH₃ and SiH₂) incorporated in the hydrogenated amorphous silicon were decreased in intensity during exposure of WF₆. The reduction rate was faster for the SiH₃ species than for the SiH₂ species. The mass spectrometric analysis revealed that evolution of hydrogen into the gas phase took place prior to that of silicon fluorides. These results strongly suggest that WF₆ reacts preferentially with the SiH₃ species present in the hydrogen-rich surface layer.

Original language	English
Pages (from-to)	1060-1062
Number of pages	3
Journal	Applied Physics Letters
Volume	61
Issue number	9
DOIs	https://doi.org/10.1063/1.107716
Publication status	Published - 1992

Access to Document

10.1063/1.107716

Cite this

@article{b97397bcd26649e687c21042e2774c29,

title = "In situ infrared and mass spectroscopic study of the reaction of WF 6 with hydrogenated amorphous silicon",

abstract = "The reaction process of tungsten hexafluoride (WF6) with photochemically deposited hydrogenated amorphous silicon was studied by polarization modulation infrared spectroscopy and quadruple mass spectrometry. Infrared absorption bands due to species (SiH3 and SiH2) incorporated in the hydrogenated amorphous silicon were decreased in intensity during exposure of WF6. The reduction rate was faster for the SiH3 species than for the SiH2 species. The mass spectrometric analysis revealed that evolution of hydrogen into the gas phase took place prior to that of silicon fluorides. These results strongly suggest that WF6 reacts preferentially with the SiH3 species present in the hydrogen-rich surface layer.",

author = "Toshimasa Wadayama and Hironobu Shibata and Tsutomu Ohtani and Aritada Hatta",

year = "1992",

doi = "10.1063/1.107716",

language = "English",

volume = "61",

pages = "1060--1062",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "9",

}

TY - JOUR

T1 - In situ infrared and mass spectroscopic study of the reaction of WF 6 with hydrogenated amorphous silicon

AU - Wadayama, Toshimasa

AU - Shibata, Hironobu

AU - Ohtani, Tsutomu

AU - Hatta, Aritada

PY - 1992

Y1 - 1992

N2 - The reaction process of tungsten hexafluoride (WF6) with photochemically deposited hydrogenated amorphous silicon was studied by polarization modulation infrared spectroscopy and quadruple mass spectrometry. Infrared absorption bands due to species (SiH3 and SiH2) incorporated in the hydrogenated amorphous silicon were decreased in intensity during exposure of WF6. The reduction rate was faster for the SiH3 species than for the SiH2 species. The mass spectrometric analysis revealed that evolution of hydrogen into the gas phase took place prior to that of silicon fluorides. These results strongly suggest that WF6 reacts preferentially with the SiH3 species present in the hydrogen-rich surface layer.

AB - The reaction process of tungsten hexafluoride (WF6) with photochemically deposited hydrogenated amorphous silicon was studied by polarization modulation infrared spectroscopy and quadruple mass spectrometry. Infrared absorption bands due to species (SiH3 and SiH2) incorporated in the hydrogenated amorphous silicon were decreased in intensity during exposure of WF6. The reduction rate was faster for the SiH3 species than for the SiH2 species. The mass spectrometric analysis revealed that evolution of hydrogen into the gas phase took place prior to that of silicon fluorides. These results strongly suggest that WF6 reacts preferentially with the SiH3 species present in the hydrogen-rich surface layer.

UR - http://www.scopus.com/inward/record.url?scp=11644318983&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=11644318983&partnerID=8YFLogxK

U2 - 10.1063/1.107716

DO - 10.1063/1.107716

M3 - Article

AN - SCOPUS:11644318983

SN - 0003-6951

VL - 61

SP - 1060

EP - 1062

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 9

ER -

In situ infrared and mass spectroscopic study of the reaction of WF ₆ with hydrogenated amorphous silicon

Abstract

Access to Document

Other files and links

Fingerprint

Cite this