The reaction of dimethylaluminum hydride (DMAH) with photochemically deposited hydrogenated amorphous silicon (a-Si:H) has been studied in situ with polarization modulation IR spectroscopy. Below 473 K, the absorption bands due to SiHs species incorporated in the a-Si:H completely disappear upon exposure to DMAH under UV illumination while those due to SiH2 species remain nearly unchanged. The intensity reduction of the SiH2 absorption bands is observed above 473 K. These spectral changes are observed only in early stages of DMAH exposure. These results suggest that DMAH reacts with SiH2 species present on the topmost surface of the a-Si:H film.
- Amorphous silicon
- Dimethylaluminum hydride