TY - JOUR
T1 - In situ study of hydriding-dehydriding properties in some Pd/Mg thin films with different degree of Mg crystallization
AU - Higuchi, K.
AU - Kajioka, H.
AU - Toiyama, K.
AU - Fujii, H.
AU - Orimo, S.
AU - Kikuchi, Y.
N1 - Funding Information:
This work was supported by the Research Development Corporation of Japan and Hiroshima Prefecture and the Proposal-Based New Industry Creative Type Technology R&D Promotion Program from the New Energy and Industrial Technology Development Organization (NEDO) of Japan. This research was mainly investigated at Hiroshima Prefecture Joint Research Center for Advanced Technology in Higashi-Hiroshima city.
PY - 1999/12/20
Y1 - 1999/12/20
N2 - A new in situ system with the functions of thin film formation and analysis of hydrogen absorption-desorption properties has been developed to clarify hydrogen storage properties in nano-scaled composites. In this work, some Pd/Mg films (Pd (25 nm)-coated Mg (200 nm) films) with different degree of crystallization in the Mg layer were prepared in different sputtering conditions by changing RF coil powers and argon pressures. Hydrogenation under hydrogen gas pressure of 0.1 MPa at 373 K for 24 h indicated that MgH2 and non-crystalline Mg hydrides were formed in all the Pd/Mg films and the hydrogen content reached 2.9 to approximately 6.6 mass% independent of the degree of Mg crystallization. From the thermal desorption spectrum, it was deduced that the dehydriding temperature decreased with decreasing the degree of crystallization in the Mg layer in Pd/Mg films and the Pd/Mg film with lowest crystallization absorbed 5.6 mass% of hydrogen and all the hydrogen desorbed at a temperature lower than 463 K in vacuum.
AB - A new in situ system with the functions of thin film formation and analysis of hydrogen absorption-desorption properties has been developed to clarify hydrogen storage properties in nano-scaled composites. In this work, some Pd/Mg films (Pd (25 nm)-coated Mg (200 nm) films) with different degree of crystallization in the Mg layer were prepared in different sputtering conditions by changing RF coil powers and argon pressures. Hydrogenation under hydrogen gas pressure of 0.1 MPa at 373 K for 24 h indicated that MgH2 and non-crystalline Mg hydrides were formed in all the Pd/Mg films and the hydrogen content reached 2.9 to approximately 6.6 mass% independent of the degree of Mg crystallization. From the thermal desorption spectrum, it was deduced that the dehydriding temperature decreased with decreasing the degree of crystallization in the Mg layer in Pd/Mg films and the Pd/Mg film with lowest crystallization absorbed 5.6 mass% of hydrogen and all the hydrogen desorbed at a temperature lower than 463 K in vacuum.
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U2 - 10.1016/S0925-8388(99)00470-3
DO - 10.1016/S0925-8388(99)00470-3
M3 - Conference article
AN - SCOPUS:0033284049
SN - 0925-8388
VL - 293
SP - 484
EP - 489
JO - Journal of Alloys and Compounds
JF - Journal of Alloys and Compounds
T2 - Proceedings of the 1998 International Symposium on Metal-Hydrogen Systems - Fundamentals and Applications (MH98)
Y2 - 4 October 1998 through 9 October 1998
ER -