In-situ TEM observation of interfacial reactions in the Zr/Si system

Hiroyuki Tanaka, Toyohiko J. Konno, Robert Sinclair

Research output: Contribution to journalConference articlepeer-review

1 Citation (Scopus)

Abstract

The interfacial reactions in the Zr/Si system were studied by in-situ cross-section TEM including high resolution mode. The reactions consisted of formation of an amorphous interlayer followed by the nucleation and growth of crystalline ZrSi2. The development of the amorphous layer was found to involve two different stages. The ZrSi2 was also found to grow layer-by-layer into the Si via a ledge mechanism.

Original languageEnglish
Pages (from-to)481-485
Number of pages5
JournalMaterials Research Society Symposium Proceedings
Volume337
DOIs
Publication statusPublished - 1994
EventProceedings of the 1994 MRS Spring Meeting - San Francisco, CA, USA
Duration: 1994 Apr 41994 Apr 8

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