ZrO2 was incorporated into MoSi2 partially sintered bodies by means of Chemical Vapour Infiltration(CVI). Metal Organic(MO) precursor was used for the purpose of filling out the fine pore networks. Infiltration kinetics was investigated by observing the infiltrated microstructures under different conditions, and the infiltrated distance was estimated by means of one dimensional analytical model, and it was possible to explain the experimental result at 2.6kPa. Infiltration temperature at 673K resulted in the low crystallinity of the deposited ZrO2 and the post annealing treatment was conducted. Microstructural changes was observed by means of TEM. Optimum conditions for fabrication of MoSi2/ZrO2 by CVI were discussed taking account of the obtained results.
|Number of pages||4|
|Journal||Key Engineering Materials|
|Publication status||Published - 1999|
- Chemical Vapour Infiltration
- Metal Organic Precursor
- Post Annealing