TY - JOUR
T1 - Inductively coupled plasma generator for an environmentally benign perfluorocarbon abatement system
AU - Suzuki, Katsumasa
AU - Ishihara, Yoshio
AU - Sakoda, Kaoru
AU - Shirai, Yasuyuki
AU - Teramoto, Akinobu
AU - Hirayama, Masaki
AU - Ohmi, Tadahiro
AU - Watanabe, Takayuki
AU - Ito, Takashi
PY - 2009
Y1 - 2009
N2 - Although conventional plasma-resolution-type abatement systems for perfluorocarbons (PFCs) achieve PFC removal efficiencies of more than 98%, they consume a lot of electricity. To diminish global warming by reducing C O2 equivalent emissions, an effective low power-consumption plasma generator is essential. The authors found that the pressure at which the electrical discharge can be maintained at the same rf power supply output increased with the number of turns per unit length of coil. In addition, they revealed that the C F4 removal efficiency rose with increasing pressure. A plasma generator employing a modified cylindrical inductively coupled plasma chamber with 1.1 turnscm achieved a C F4 removal efficiency of 99.0% under conditions of a C F4 flow rate of 10 cm3 min, a pressure of 0.9 kPa, and a rf power supply output of 1.5 kW. The C O2 equivalent removal efficiency was calculated to be 93.5%, an improvement of 6.7% over that of the previous system.
AB - Although conventional plasma-resolution-type abatement systems for perfluorocarbons (PFCs) achieve PFC removal efficiencies of more than 98%, they consume a lot of electricity. To diminish global warming by reducing C O2 equivalent emissions, an effective low power-consumption plasma generator is essential. The authors found that the pressure at which the electrical discharge can be maintained at the same rf power supply output increased with the number of turns per unit length of coil. In addition, they revealed that the C F4 removal efficiency rose with increasing pressure. A plasma generator employing a modified cylindrical inductively coupled plasma chamber with 1.1 turnscm achieved a C F4 removal efficiency of 99.0% under conditions of a C F4 flow rate of 10 cm3 min, a pressure of 0.9 kPa, and a rf power supply output of 1.5 kW. The C O2 equivalent removal efficiency was calculated to be 93.5%, an improvement of 6.7% over that of the previous system.
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U2 - 10.1116/1.3106612
DO - 10.1116/1.3106612
M3 - Article
AN - SCOPUS:65549114687
SN - 0734-2101
VL - 27
SP - 465
EP - 470
JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
IS - 3
ER -