TY - JOUR
T1 - Industrial application of atom probe tomography to semiconductor devices
AU - Giddings, Alexander Devin
AU - Koelling, Sebastian
AU - Shimizu, Yasuo
AU - Estivill, Robert
AU - Inoue, Koji
AU - Vandervorst, Wilfried
AU - Yeoh, Wai Kong
N1 - Funding Information:
Y.S. is grateful to JSPS KAKENHI grant nos. 24760246 , 26289097 , and 15H05413 . R.E. is grateful to ANRT for grant CIFRE 2012/0679 .
Publisher Copyright:
© 2017 Acta Materialia Inc.
PY - 2018/4/15
Y1 - 2018/4/15
N2 - Advanced semiconductor devices offer a metrology challenge due to their small feature size, diverse composition and intricate structure. Atom probe tomography (APT) is an emerging technique that provides 3D compositional analysis at the atomic-scale; as such, it seems uniquely suited to meet these challenges. However, the semiconductor industry has demanding requirements against which the techniques in use are evaluated. This article explores the use of APT in the semiconductor industry, showing the potential of the technique, the obstacles that occur in practise, and possible future developments.
AB - Advanced semiconductor devices offer a metrology challenge due to their small feature size, diverse composition and intricate structure. Atom probe tomography (APT) is an emerging technique that provides 3D compositional analysis at the atomic-scale; as such, it seems uniquely suited to meet these challenges. However, the semiconductor industry has demanding requirements against which the techniques in use are evaluated. This article explores the use of APT in the semiconductor industry, showing the potential of the technique, the obstacles that occur in practise, and possible future developments.
KW - 3D Metrology
KW - Atom probe tomography
KW - Dopant engineering
KW - Failure analysis
KW - Semiconductor devices
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U2 - 10.1016/j.scriptamat.2017.09.004
DO - 10.1016/j.scriptamat.2017.09.004
M3 - Article
AN - SCOPUS:85033774533
SN - 1359-6462
VL - 148
SP - 82
EP - 90
JO - Scripta Materialia
JF - Scripta Materialia
ER -