Influence of growth temperature and cooling rate on the growth of Si epitaxial layer by dropping-type liquid phase epitaxy from the pure Si melt

Zengmei Wang, Kentaro Kutsukake, Hitoshi Kodama, Noritaka Usami, Kozo Fujiwara, Yoshitaro Nose, Kazuo Nakajima

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

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