Influence of work function variation of metal gates on fluctuation of sub-threshold drain current for fin field-effect transistors with undoped channels

Takashi Matsukawa, Yongxun Liu, Kazuhiko Endo, Junichi Tsukada, Hiromi Yamauchi, Yuki Ishikawa, Shinichi O'uchi, Wataru Mizubayashi, Hiroyuki Ota, Shinji Migita, Yukinori Morita, Meishoku Masahara

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

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Physics

Material Science