Infrared spectroscopic study of dimethylaluminum-hydride adsorption on oxidized, hydrogen-terminated, and reconstructed Si surfaces

T. Wadayama; K. Takeuchi; K. Mukai; T. Tanabe; A. Hatta

doi:10.1116/1.1434966

Infrared spectroscopic study of dimethylaluminum-hydride adsorption on oxidized, hydrogen-terminated, and reconstructed Si surfaces

T. Wadayama, K. Takeuchi, K. Mukai, T. Tanabe, A. Hatta

ENV - Frontier Science for Advanced Environment

Tohoku University

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

Adsorption and decomposition of dimethylaluminum-hydride (DMAH) on various Si(111) and Si(100) surfaces was investigated at 90 K using multiple reflection infrared (IR) attenuated total reflection (ATR) method. The infrared absorption on the chemically oxidized Si(111) surface due to DMAH increased linearly with DMAH exposure which indicate that DMAH was condensed on the surface. The results show that DMAH exposure to the hydrogen terminated Si(100) surface leads to a slight intensity decrease in the bands due to surface hydrides.

Original language	English
Pages (from-to)	299-304
Number of pages	6
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	20
Issue number	2
DOIs	https://doi.org/10.1116/1.1434966
Publication status	Published - 2002 Mar

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title = "Infrared spectroscopic study of dimethylaluminum-hydride adsorption on oxidized, hydrogen-terminated, and reconstructed Si surfaces",

abstract = "Adsorption and decomposition of dimethylaluminum-hydride (DMAH) on various Si(111) and Si(100) surfaces was investigated at 90 K using multiple reflection infrared (IR) attenuated total reflection (ATR) method. The infrared absorption on the chemically oxidized Si(111) surface due to DMAH increased linearly with DMAH exposure which indicate that DMAH was condensed on the surface. The results show that DMAH exposure to the hydrogen terminated Si(100) surface leads to a slight intensity decrease in the bands due to surface hydrides.",

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year = "2002",

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T1 - Infrared spectroscopic study of dimethylaluminum-hydride adsorption on oxidized, hydrogen-terminated, and reconstructed Si surfaces

AU - Wadayama, T.

AU - Takeuchi, K.

AU - Mukai, K.

AU - Tanabe, T.

AU - Hatta, A.

PY - 2002/3

Y1 - 2002/3

N2 - Adsorption and decomposition of dimethylaluminum-hydride (DMAH) on various Si(111) and Si(100) surfaces was investigated at 90 K using multiple reflection infrared (IR) attenuated total reflection (ATR) method. The infrared absorption on the chemically oxidized Si(111) surface due to DMAH increased linearly with DMAH exposure which indicate that DMAH was condensed on the surface. The results show that DMAH exposure to the hydrogen terminated Si(100) surface leads to a slight intensity decrease in the bands due to surface hydrides.

AB - Adsorption and decomposition of dimethylaluminum-hydride (DMAH) on various Si(111) and Si(100) surfaces was investigated at 90 K using multiple reflection infrared (IR) attenuated total reflection (ATR) method. The infrared absorption on the chemically oxidized Si(111) surface due to DMAH increased linearly with DMAH exposure which indicate that DMAH was condensed on the surface. The results show that DMAH exposure to the hydrogen terminated Si(100) surface leads to a slight intensity decrease in the bands due to surface hydrides.

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Infrared spectroscopic study of dimethylaluminum-hydride adsorption on oxidized, hydrogen-terminated, and reconstructed Si surfaces

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