Adsorption and decomposition of dimethylaluminum-hydride (DMAH) on various Si(111) and Si(100) surfaces was investigated at 90 K using multiple reflection infrared (IR) attenuated total reflection (ATR) method. The infrared absorption on the chemically oxidized Si(111) surface due to DMAH increased linearly with DMAH exposure which indicate that DMAH was condensed on the surface. The results show that DMAH exposure to the hydrogen terminated Si(100) surface leads to a slight intensity decrease in the bands due to surface hydrides.
|Number of pages||6|
|Journal||Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films|
|Publication status||Published - 2002 Mar|