TY - JOUR
T1 - Inhomogeneous interface dipole effect at the Schottky junctions of PdCrO2on β -Ga2O3(2 ¯ 01) substrates
AU - Miyakawa, T.
AU - Harada, T.
AU - Ito, S.
AU - Tsukazaki, A.
N1 - Funding Information:
We acknowledge the NEOARK Corporation for the use of a maskless lithography system PALET. This work was performed under the Inter-university Cooperative Research Program of the CRDAM-IMR, Tohoku University (Proposal No. 19G0410) and was partly supported by a Grant-in-Aid for Early-Career Scientists (No. 18K14121) from the Japan Society for the Promotion of Science (JSPS) and JST CREST (No. JPMJCR18T2).
Publisher Copyright:
© 2020 Author(s).
PY - 2020/7/14
Y1 - 2020/7/14
N2 - We report the lateral and vertical electrical conduction properties of PdCrO2 thin films grown on insulating Al2O3 (001) and conducting β-Ga2O3 (2 ¯ 01) substrates. The c-axis oriented PdCrO2 films on the both substrates showed metallic temperature dependence of in-plane resistivity down to 2 K. In PdCrO2/β-Ga2O3 vertical devices, rectifying current density-voltage (J-V) characteristics revealed the formation of a Schottky barrier at the PdCrO2/β-Ga2O3 interface. The Schottky barrier height (SBH) of 1.2-1.8 eV, evaluated by J-V characteristics, is significantly larger than 0.8 eV expected from the usual Mott-Schottky relation based on the electron affinity of β-Ga2O3 (4.0 eV) and the work function of PdCrO2 (4.8 eV) determined by ultraviolet photoelectron spectroscopy. The enhanced SBH at the PdCrO2/β-Ga2O3 interface indicates the existence of interface dipoles, as in the case of PdCoO2/β-Ga2O3. Besides, we observed a large difference of the SBH between the J-V measurements (1.2-1.8 eV) and capacitance measurements (2.0-2.1 eV). While the SBH is definitely enhanced by the interface dipole effect, the level of enhancement at the PdCrO2/β-Ga2O3 interface is rather inhomogeneous, different from that at the PdCoO2/β-Ga2O3. In fact, two typical types of interfaces were found by a high-angle annular dark-field scanning transmission electron microscope, which would be the origin of the inhomogeneous SBH. Further understanding of the interface formation between delafossite oxides and β-Ga2O3 (2 ¯ 01) will improve the performance of Ga2O3 Schottky junctions as a power diode available at high temperatures.
AB - We report the lateral and vertical electrical conduction properties of PdCrO2 thin films grown on insulating Al2O3 (001) and conducting β-Ga2O3 (2 ¯ 01) substrates. The c-axis oriented PdCrO2 films on the both substrates showed metallic temperature dependence of in-plane resistivity down to 2 K. In PdCrO2/β-Ga2O3 vertical devices, rectifying current density-voltage (J-V) characteristics revealed the formation of a Schottky barrier at the PdCrO2/β-Ga2O3 interface. The Schottky barrier height (SBH) of 1.2-1.8 eV, evaluated by J-V characteristics, is significantly larger than 0.8 eV expected from the usual Mott-Schottky relation based on the electron affinity of β-Ga2O3 (4.0 eV) and the work function of PdCrO2 (4.8 eV) determined by ultraviolet photoelectron spectroscopy. The enhanced SBH at the PdCrO2/β-Ga2O3 interface indicates the existence of interface dipoles, as in the case of PdCoO2/β-Ga2O3. Besides, we observed a large difference of the SBH between the J-V measurements (1.2-1.8 eV) and capacitance measurements (2.0-2.1 eV). While the SBH is definitely enhanced by the interface dipole effect, the level of enhancement at the PdCrO2/β-Ga2O3 interface is rather inhomogeneous, different from that at the PdCoO2/β-Ga2O3. In fact, two typical types of interfaces were found by a high-angle annular dark-field scanning transmission electron microscope, which would be the origin of the inhomogeneous SBH. Further understanding of the interface formation between delafossite oxides and β-Ga2O3 (2 ¯ 01) will improve the performance of Ga2O3 Schottky junctions as a power diode available at high temperatures.
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U2 - 10.1063/5.0011783
DO - 10.1063/5.0011783
M3 - Article
AN - SCOPUS:85089171811
SN - 0021-8979
VL - 128
JO - Journal of Applied Physics
JF - Journal of Applied Physics
IS - 2
M1 - 025302
ER -