Abstract
The first operation of an integrated differential notch-type photoconductor and dual gate (DG) double heterostructure (DH) MESFET in Ga0.47In0.53As is reported. The starting material was grown by molecular beam epitaxy on a semi-insulating InP substrate. A 2 mW HeNe laser with a spot diameter of 0.5 mm could modulate the drain current by 300 µA with the upper gate suitably biased.
Original language | English |
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Pages (from-to) | 7-9 |
Number of pages | 3 |
Journal | IEEE Electron Device Letters |
Volume | 2 |
Issue number | 1 |
DOIs | |
Publication status | Published - 1981 Jan |