Integration of Damage-less Probe Cards Using Nano-TSV Technology for Microbumped Wafer Testing

Takafumi Fukushima, Shinichi Sakuyama, Masatomo Takahashi, Hiroyuki Hashimoto, Jichoel Bea, Theodorus Marcello, Hisashi Kino, Tetsu Tanaka, Mitsumasa Koyanagi, Murugesan Mariappan

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

This paper describes nano-scale probe integration on a printed circuit board (PCB) using electroless TSV formation technology for achieving small scrub marks when testing solder microbumps formed on LSI wafers. The nanoprobes are resulted from the backside grinding and dry etching of Si substrates in which an array of Ni/Cu-TSVs with a tip diameter of 500 nm are fabricated. The TSV nanoprobes are also transferred to the PCB before the Si etch step. We demonstrate the probe contact to a thin solder layer for testing wafer-level packages with fine-pitch microbumps. In addition, the nanoprobes are electrically and mechanically characterized in this study.

Original languageEnglish
Title of host publicationIEEE International 3D System Integration Conference, 3DIC 2021
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781665417068
DOIs
Publication statusPublished - 2021
Event2021 IEEE International 3D System Integration Conference, 3DIC 2021 - Virtual, Raleigh, United States
Duration: 2021 Nov 152021 Nov 18

Publication series

NameIEEE International 3D System Integration Conference, 3DIC 2021

Conference

Conference2021 IEEE International 3D System Integration Conference, 3DIC 2021
Country/TerritoryUnited States
CityVirtual, Raleigh
Period21/11/1521/11/18

Keywords

  • nano-TSV
  • nanoprobes
  • probe cards
  • water testing

ASJC Scopus subject areas

  • Fluid Flow and Transfer Processes
  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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