Interface flattening of giant magnetoresistance (GMR)/tunnel magnetoresistance (TMR) multilayers by oxygen addition in their sputter-deposition process

Masakiyo Tsunoda; Migaku Takahashi

doi:10.3131/jvsj.48.34

Interface flattening of giant magnetoresistance (GMR)/tunnel magnetoresistance (TMR) multilayers by oxygen addition in their sputter-deposition process

ENG - Electronic Engineering

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	34-38
Number of pages	5
Journal	Shinku/Journal of the Vacuum Society of Japan
Volume	48
Issue number	1
DOIs	https://doi.org/10.3131/jvsj.48.34
Publication status	Published - 2005

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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Interface flattening of giant magnetoresistance (GMR)/tunnel magnetoresistance (TMR) multilayers by oxygen addition in their sputter-deposition process

ASJC Scopus subject areas

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