TY - JOUR
T1 - Intrinsic transit delay and effective electron velocity of AlGaN/GaN high electron mobility transistors
AU - Suemitsu, Tetsuya
AU - Shiojima, Kenji
AU - Makimura, Takashi
AU - Shigekawa, Naoteru
PY - 2005
Y1 - 2005
N2 - A delay time analysis was carried out for AlGaN/GaN high electron mobility transistors (HEMTs) with gate lengths of 120-210nm. The influence of the large parasitics in the access region is counted out by de-embedding these parasitics from the measured parameters. From the obtained intrinsic transit delay, the effective electron velocity is estimated to be 1.86 × 107 cm/s. The parasitic delay is rather a major cause of delay in the devices tested. We also found that the channel charging time is not negligible even at the gate length of 120nm, whereas it can be in the InP HEMTs with the same gate length.
AB - A delay time analysis was carried out for AlGaN/GaN high electron mobility transistors (HEMTs) with gate lengths of 120-210nm. The influence of the large parasitics in the access region is counted out by de-embedding these parasitics from the measured parameters. From the obtained intrinsic transit delay, the effective electron velocity is estimated to be 1.86 × 107 cm/s. The parasitic delay is rather a major cause of delay in the devices tested. We also found that the channel charging time is not negligible even at the gate length of 120nm, whereas it can be in the InP HEMTs with the same gate length.
KW - Delay time
KW - Field effect transistor
KW - GaN
KW - High electron mobility transistor
KW - High frequency
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U2 - 10.1143/JJAP.44.L211
DO - 10.1143/JJAP.44.L211
M3 - Article
AN - SCOPUS:17444425384
SN - 0021-4922
VL - 44
SP - L211-L213
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 1-7
ER -