Ion-Implantation-Induced Disorder in FePt-C Thin Films

Durgesh Kumar; Surbhi Gupta; Kim Kong Tham; Razia Nongjai; Shin Saito; Kandasami Asokan; S. N. Piramanayagam

doi:10.1109/TMAG.2018.2867912

Ion-Implantation-Induced Disorder in FePt-C Thin Films

Durgesh Kumar, Surbhi Gupta, Kim Kong Tham, Razia Nongjai, Shin Saito, Kandasami Asokan, S. N. Piramanayagam

ENG - Electronic Engineering

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

The effects of ion implantation through a mask on the structural and magnetic properties of FePt-C films were investigated. The mask pattern was fabricated using self-assembly of di-block copolymers. For implantation, high- (40 keV for 14N+ and 100 keV for 40Ar+ ) and low- (7.5 keV for 14N+ and 4.5 keV for 40Ar+ ) energy 14N+ and 40Ar+ ions were used to modify the structural and magnetic properties of these films. The X-ray diffraction and transport of ions in matter simulations were performed for understanding the structural changes due to the ion implantations. These results revealed the conversion of face-centered tetragonal phase to face-centered cubic (FCC) phase for 40Ar+ ion implantations and increase in inter-planar spacing of FCC FePt (111) planes for 14N+ ion implantations. Magnetic properties were then probed by using a vibrating sample magnetometer (VSM), torque magnetometer, and magnetic force microscopy (MFM). The results from VSM and torque magnetometer showed a change in anisotropy from out-of-plane to in-plane directions for all the implantation cases except for low-energy 40Ar+ ion implantations. The MFM images also showed an absence of stripe domains confirming the above-mentioned effects.

Original language	English
Article number	8468213
Journal	IEEE Transactions on Magnetics
Volume	55
Issue number	3
DOIs	https://doi.org/10.1109/TMAG.2018.2867912
Publication status	Published - 2019 Mar

Keywords

Ion implantation
magneto-crystalline anisotropy
self-assembly (SA)
torque magnetometry

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10.1109/TMAG.2018.2867912

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title = "Ion-Implantation-Induced Disorder in FePt-C Thin Films",

abstract = "The effects of ion implantation through a mask on the structural and magnetic properties of FePt-C films were investigated. The mask pattern was fabricated using self-assembly of di-block copolymers. For implantation, high- (40 keV for 14N+ and 100 keV for 40Ar+ ) and low- (7.5 keV for 14N+ and 4.5 keV for 40Ar+ ) energy 14N+ and 40Ar+ ions were used to modify the structural and magnetic properties of these films. The X-ray diffraction and transport of ions in matter simulations were performed for understanding the structural changes due to the ion implantations. These results revealed the conversion of face-centered tetragonal phase to face-centered cubic (FCC) phase for 40Ar+ ion implantations and increase in inter-planar spacing of FCC FePt (111) planes for 14N+ ion implantations. Magnetic properties were then probed by using a vibrating sample magnetometer (VSM), torque magnetometer, and magnetic force microscopy (MFM). The results from VSM and torque magnetometer showed a change in anisotropy from out-of-plane to in-plane directions for all the implantation cases except for low-energy 40Ar+ ion implantations. The MFM images also showed an absence of stripe domains confirming the above-mentioned effects.",

keywords = "Ion implantation, magneto-crystalline anisotropy, self-assembly (SA), torque magnetometry",

author = "Durgesh Kumar and Surbhi Gupta and Tham, {Kim Kong} and Razia Nongjai and Shin Saito and Kandasami Asokan and Piramanayagam, {S. N.}",

note = "Funding Information: ACKNOWLEDGMENT This work was supported in part by MOE AcRF Tier1 under Grant RG163/15 and in part by NRF-IIP under Grant NRF2015-IIP003-001. The authors would like to thank Mr. Kedar Mal and Mr. Raj Kumar of Inter University Accelerator Centre, New Delhi, India, for providing us low-and high-energy ion implantation facilities and FACTS Laboratory, NTU, Singapore, for allowing us the usage of X-ray diffraction equipment. Publisher Copyright: {\textcopyright} 1965-2012 IEEE.",

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AU - Kumar, Durgesh

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AU - Tham, Kim Kong

AU - Nongjai, Razia

AU - Saito, Shin

AU - Asokan, Kandasami

AU - Piramanayagam, S. N.

N1 - Funding Information: ACKNOWLEDGMENT This work was supported in part by MOE AcRF Tier1 under Grant RG163/15 and in part by NRF-IIP under Grant NRF2015-IIP003-001. The authors would like to thank Mr. Kedar Mal and Mr. Raj Kumar of Inter University Accelerator Centre, New Delhi, India, for providing us low-and high-energy ion implantation facilities and FACTS Laboratory, NTU, Singapore, for allowing us the usage of X-ray diffraction equipment. Publisher Copyright: © 1965-2012 IEEE.

PY - 2019/3

Y1 - 2019/3

N2 - The effects of ion implantation through a mask on the structural and magnetic properties of FePt-C films were investigated. The mask pattern was fabricated using self-assembly of di-block copolymers. For implantation, high- (40 keV for 14N+ and 100 keV for 40Ar+ ) and low- (7.5 keV for 14N+ and 4.5 keV for 40Ar+ ) energy 14N+ and 40Ar+ ions were used to modify the structural and magnetic properties of these films. The X-ray diffraction and transport of ions in matter simulations were performed for understanding the structural changes due to the ion implantations. These results revealed the conversion of face-centered tetragonal phase to face-centered cubic (FCC) phase for 40Ar+ ion implantations and increase in inter-planar spacing of FCC FePt (111) planes for 14N+ ion implantations. Magnetic properties were then probed by using a vibrating sample magnetometer (VSM), torque magnetometer, and magnetic force microscopy (MFM). The results from VSM and torque magnetometer showed a change in anisotropy from out-of-plane to in-plane directions for all the implantation cases except for low-energy 40Ar+ ion implantations. The MFM images also showed an absence of stripe domains confirming the above-mentioned effects.

AB - The effects of ion implantation through a mask on the structural and magnetic properties of FePt-C films were investigated. The mask pattern was fabricated using self-assembly of di-block copolymers. For implantation, high- (40 keV for 14N+ and 100 keV for 40Ar+ ) and low- (7.5 keV for 14N+ and 4.5 keV for 40Ar+ ) energy 14N+ and 40Ar+ ions were used to modify the structural and magnetic properties of these films. The X-ray diffraction and transport of ions in matter simulations were performed for understanding the structural changes due to the ion implantations. These results revealed the conversion of face-centered tetragonal phase to face-centered cubic (FCC) phase for 40Ar+ ion implantations and increase in inter-planar spacing of FCC FePt (111) planes for 14N+ ion implantations. Magnetic properties were then probed by using a vibrating sample magnetometer (VSM), torque magnetometer, and magnetic force microscopy (MFM). The results from VSM and torque magnetometer showed a change in anisotropy from out-of-plane to in-plane directions for all the implantation cases except for low-energy 40Ar+ ion implantations. The MFM images also showed an absence of stripe domains confirming the above-mentioned effects.

KW - Ion implantation

KW - magneto-crystalline anisotropy

KW - self-assembly (SA)

KW - torque magnetometry

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JF - IEEE Transactions on Magnetics

IS - 3

M1 - 8468213

ER -

Ion-Implantation-Induced Disorder in FePt-C Thin Films

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Keywords

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